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Vacuum ultra violet absorption spectroscopy of 193 nm photoresists

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Abstract

193 nm photoresists which are methacrylate-based polymers are very sensitive to vacuum ultra violet (VUV) light (100 nm<λ<200 nm) generated by plasmas used for pattern transfer technologies. Upon plasma treatment the physical properties of the polymers can be deeply modified. To better understand the chemical changes involved, the absorption coefficient of a commercial 193 nm photoresist has been measured in the 120–280 nm wavelength range using a home built experimental set-up. The different contributions to the absorption were identified by also measuring the spectra of model polymers and simpler polymer chains. This knowledge was then used to identify the chemical changes in the photoresist upon heating up to 240°C.

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References

  1. G.M. Wallraff, R.D. Allen, W.D. Hinsberg, C.F. Larson, R.D. Johnson, R. DiPietro, G. Breyta, N. Hacker, J. Vac. Sci. Technol. B 11, 2783 (1993)

    Article  Google Scholar 

  2. S. Takechi, M. Takahashi, A. Kotachi, K. Nozaki, E. Yano, I. Hanyu, J. Photopolym. Sci. Technol. 9, 475 (1996)

    Article  Google Scholar 

  3. M. McCallum, K.R. Dean, J.D. Byers, Microelectron. Eng. 46, 335 (1999)

    Article  Google Scholar 

  4. E. Pargon, M. Martin, J. Thiault, O. Joubert, J. Foucher, T. Lill, J. Vac. Sci. Technol. B 26, 1011 (2008)

    Article  Google Scholar 

  5. A.P. Mahorowala, K.-J. Chen, R. Sooriyakumaran, A. Clancy, D. Murthy, S. Rasgon, Proc. SPIE 5753, 380 (2005)

    Article  ADS  Google Scholar 

  6. H. Kawahira, N. Matsuzawa, E. Matsui, A. Ando, K. Salam, M. Yoshida, Y. Yamaguchi, K. Kugimiya, T. Tatsumi, H. Nakano, T. Iwai, M. Irie, Proc. SPIE 6153, 615319 (2006)

    Article  Google Scholar 

  7. M.-C. Kim, D. Shamiryan, Y. Jung, W. Boullart, C.-J. Kang, H.-K. Cho, J. Vac. Sci. Technol. B 24, 2645 (2006)

    Article  Google Scholar 

  8. E. Pargon, M. Martin, K. Menguelti, L. Azarnouche, J. Foucher, O. Joubert, Appl. Phys. Lett. 94, 103111 (2009)

    Article  ADS  Google Scholar 

  9. D. Nest, T.-Y. Chung, D.B. Graves, S. Engelmann, R.L. Bruce, F. Weilnboeck, G.S. Oehrlein, D. Wang, C. Andes, E.A. Hudson, Plasma Proc. Polym. 6, 649 (2009)

    Article  Google Scholar 

  10. S. Engelmann, R.L. Bruce, T. Kwon, R. Phaneuf, G.S. Oehrlein, Y.C. Bae, C. Andes, D. Graves, D. Nest, E.A. Hudson, P. Lazzeri, E. Iacob, M. Anderle, J. Vac. Sci. Technol. B 25, 1353 (2007)

    Article  Google Scholar 

  11. M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, G.S. Oehrlein, J. Vac. Sci. Technol. B 26, 1637 (2008)

    Article  Google Scholar 

  12. E. Kesters, M. Claes, Q.T. Le, M. Lux, A. Franquet, G. Vereecke, P.W. Mertens, M.M. Frank, R. Carleer, P. Adriaensens, J.J. Biebuyk, S. Bebelman, Thin Solid Films 516, 3454 (2008)

    Article  ADS  Google Scholar 

  13. E. Pargon, K. Menguelti, M. Martin, A. Bazin, O. Chaix-Pluchery, C. Sourd, S. Derrough, T. Lill, O. Joubert, J. Appl. Phys. 105, 094902 (2009)

    Article  ADS  Google Scholar 

  14. T.-Y. Chung, D. Nest, D.B. Graves, F. Weilnboeck, R.L. Bruce, G.S. Oehrlein, D. Wang, M. Li, E.A. Hudson, J. Phys. D, Appl. Phys. 43, 1 (2010)

    Google Scholar 

  15. C. Cismaru, J.L. Shohet, Appl. Phys. Lett. 74, 2599 (1999)

    Article  ADS  Google Scholar 

  16. V.M. Donnelly, M.V. Malyshev, M. Schabel, A. Kornblit, W. Tai, I.P. Herman, N.C.M. Fuller, Plasma Sources Sci. Technol. 11, A26 (2002)

    Article  ADS  Google Scholar 

  17. Y.I. Dorofeev, V.E. Skurat, Russ. Chem. Rev. 51, 527 (1982)

    Article  ADS  Google Scholar 

  18. V.E. Skurat, Y.I. Dorofeev, Die Ang. Makromol. Chem., Macromol. Symp. 216, 205 (1994)

    Google Scholar 

  19. M.R. Wertheimer, A.C. Fozza, A. Holländer, Nucl. Instrum. Methods Phys. Res., Sect. B, Beam Interact. Mater. Atoms 151, 65 (1999)

    Article  ADS  Google Scholar 

  20. A.C. Fozza, J.E. Klemberg-Sapieha, M.R. Wertheimer, Plasma Polym. 4, 183 (1999)

    Article  Google Scholar 

  21. R. Wilken, A. Holländer, J. Behnisch, Plasma Polym. 7, 185 (2002)

    Article  Google Scholar 

  22. V. Skurat, Nucl. Instrum. Methods Phys. Res., Sect. B, Beam Interact. Mater. Atoms 208, 27 (2003)

    Article  ADS  Google Scholar 

  23. F.-E. Truica-Marasescu, M.R. Wertheimer, Macromol. Chem. Phys. 206, 744 (2005)

    Article  Google Scholar 

  24. F. Weilnboeck, R.L. Bruce, S. Engelmann, G.S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E.A. Hudson, J. Vac. Sci. Technol. B 28, 993 (2010)

    Article  Google Scholar 

  25. V. Nelea, V.N. Vasilets, V.E. Skurat, F. Truica-Marasescu, M.R. Wertheimer, Plasma Proc. Polym. 7, 431 (2010)

    Article  Google Scholar 

  26. M. Schwell, H.-W. Jochims, H. Baumgärtel, F. Dulieu, S. Leach, Planet. Space Sci. 54, 1073 (2006)

    Article  ADS  Google Scholar 

  27. A. Holländer, J.E. Klemberg-Sapieha, M.R. Wertheimer, J. Polym. Sci., A, Polym. Chem. 33, 2013 (1995)

    Article  ADS  Google Scholar 

  28. C.-M. Chan, T.-M. Ko, H. Hiraoka, Surf. Sci. Rep. 24, 1 (1996)

    Article  Google Scholar 

  29. A. Holländer, J. Behnisch, Surf. Coat. Technol. 98, 855 (1998)

    Article  Google Scholar 

  30. E. Sarantopoulou, J. Kovac, Z. Kollia, I. Raptis, S. Kobe, A.C. Cefalas, Surf. Interface Anal. 40, 400 (2008)

    Article  Google Scholar 

  31. A. Holländer, R. Wilken, J. Behnish, Surf. Coat. Technol. 116–119, 788 (1999)

    Article  Google Scholar 

  32. S. Tajima, K. Komvopoulos, Appl. Phys. Lett. 89, 124102 (2006)

    Article  ADS  Google Scholar 

  33. R.H. Partridge, J. Chem. Phys. 45, 1685 (1966)

    Article  ADS  Google Scholar 

  34. J.W. Raymonda, W.T. Simpson, J. Chem. Phys. 47, 430 (1967)

    Article  ADS  Google Scholar 

  35. R.H. Partridge, J. Chem. Phys. 49, 3656 (1968)

    Article  ADS  Google Scholar 

  36. S. Onari, J. Phys. Soc. Jpn. 26, 500 (1969)

    Article  ADS  Google Scholar 

  37. S. Hashimoto, K. Seki, N. Sato, H. Inokuchi, J. Chem. Phys. 76, 163 (1981)

    Article  ADS  Google Scholar 

  38. K. Kameta, S. Machida, M. Kitajima, M. Ukai, N. Kouchi, Y. Hatano, K. Ito, J. Electron Spectrosc. Relat. Phenom. 79, 391 (1996)

    Article  Google Scholar 

  39. E.A. Costner, B.K. Long, C. Navar, S. Jockusch, X.L. Lei, P. Zimmerman, A. Campion, N.J. Turro, C.G. Willson, J. Phys. Chem. A 113, 9337 (2009)

    Article  Google Scholar 

  40. J.M.J. Frechet, Pure Appl. Chem. 64, 1239–1248 (1992)

    Article  Google Scholar 

  41. Y. Matsui, H. Sugawara, S. Seki, T. Kozawa, S. Tagawa, T. Itani, Appl. Phys. Express 1, 036001 (2008)

    Article  ADS  Google Scholar 

  42. K. Kudo, T. Iwabuchi, K. Mutoh, T. Miyata, R. Sano, K. Tanaka, Jpn. J. Appl. Phys. 29, 2572 (1990)

    Article  ADS  Google Scholar 

  43. M. Suto, X. Wang, L.C. Lee, J. Phys. Chem. 92, 3764 (1988)

    Article  Google Scholar 

  44. V.L. Orkin, E. Villenave, R.E. Huie, M.J. Kurylo, J. Phys. Chem. A 103, 9770 (1999)

    Article  Google Scholar 

  45. M. Fouchier, E. Pargon, L. Azarnouche, O. Luere, K. Menguelti, G. Cunges, N. Sadhegi, O. Joubert, in Proceedings of the 32nd International Symposium on Dry Process, Tokyo (2011)

    Google Scholar 

  46. L. Azarnourche, J. Appl. Phys. (2011, submitted)

  47. L.J. Bellamy, The Infrared Spectra of Complex Molecules (Wiley, New York, 1960)

    Google Scholar 

  48. J.Y. Lee, P.C. Painter, M.M. Coleman, Macromolecules 21, 346 (1988)

    Article  ADS  Google Scholar 

  49. R. Ayothi, Y. Yi, H.B. Cao, W. Yueh, S. Putna, C.K. Ober, Chem. Mater. 19, 1434 (2007)

    Article  Google Scholar 

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Authors and Affiliations

  1. Laboratoire des Technologies de la Microélectronique, CNRS-LTM, 17 rue des Martyrs, 38054, Grenoble Cedex 09, France

    M. Fouchier, E. Pargon, K. Menguelti & O. Joubert

  2. ST Microelectronics, 850 rue Jean Monnet, Crolles, France

    L. Azarnouche

  3. The Dow Chemical Company, Dow Electronic Materials, 455 Forest Street, Marlborough, MA, 01752, USA

    T. Cardolaccia & Y. C. Bae

Authors
  1. M. Fouchier
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  2. E. Pargon
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  3. L. Azarnouche
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  4. K. Menguelti
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  5. O. Joubert
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  6. T. Cardolaccia
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  7. Y. C. Bae
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Correspondence to M. Fouchier.

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Fouchier, M., Pargon, E., Azarnouche, L. et al. Vacuum ultra violet absorption spectroscopy of 193 nm photoresists. Appl. Phys. A 105, 399–405 (2011). https://doi.org/10.1007/s00339-011-6553-3

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  • DOI: https://doi.org/10.1007/s00339-011-6553-3

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