Abstract
Nanocrystalline iridium coatings on hafnium carbide and tantalum carbide substrates are prepared by chemical vapor deposition (MOCVD) at 600°С. Subsequent high-temperature treatment at 1100°С gives rise to chemical reactions between iridium and hafnium carbide or tantalum carbide to yield nanosized substitutional intermetallic solid solutions MIr3 – x and evolve free carbon. The occurrence of intermetallic interaction is proved by X-ray photoelectron (XPS) spectroscopy.
Similar content being viewed by others
REFERENCES
E. P. Simonenko, N. P. Simonenko, A. S. Lysenko, et al., Zh. Neorg. Khim. 65, 420 (2020). https://doi.org/10.31857/S0044457X20030149
E. P. Simonenko, N. P. Simonenko, M. I. Petrichko, et al., Zh. Neorg. Khim. 64, 1127 (2019). https://doi.org/10.1134/S0044457X19110199
E. P. Simonenko, N. P. Simonenko, V. G. Sevastyanov, et al., Russ. J. Inorg. Chem. 61, 1203 (2016). https://doi.org/10.1134/S003602361610017X.
C. Musa, R. Licheri, R. Orru, et al., Sol. En. 169, 111 (2018). https://doi.org/10.1016/j.solener.2018.04.036
E. Sani, L. Mercatelli, D. Fontani, et al., J. Renewable Sustainable En. 3, 063 107 (2011). https://doi.org/10.1063/1.3662099
W. A. Mackie, J. M. Lovell, and G. G. Magera, IVESC 2012 (IEEE, Monterey, CA, 2012), p. 129. https://doi.org/10.1109/IVESC.P.2012.6264168
W. S. Hwang, D. Chan, and B. J. Cho, IEEE Trans. Electron Dev. 55, 2469 (2008). https://doi.org/10.1109/TED.2008.927946
Kh. S. Kan and B. S. Kul’varskaya, Zh. Tekh. Fiz. 43, 1269 (1973).
V. V. Lozanov, N. I. Baklanova, N. V. Bulina, et al., ACS Appl. Mater. Interfaces 10, 13 062 (2018). https://doi.org/10.1021/acsami.8b01418
N. I. Baklanova, V. V. Lozanov, and A. T. Titov, Corros. Sci. 143, 337 (2018). https://doi.org/10.1016/j.corsci.2018.08.044
V. Yu. Vasilyev, N. B. Morozova, T. V. Basova, et al., RSC Adv. 5, 32 034 (2015). https://doi.org/10.1039/C5RA03566J
C. K. Jun and P. T. B. Shaffer, J. Less-Common Met. 24 (3), 323 (1971). https://doi.org/10.1016/0022-5088(71)90113-5
J. J. Halvorson and R. T. Wimber, J. Appl. Phys. 43, 2519 (1972). https://doi.org/10.1063/1.1661553
R. T. K. Baker and R. D. Sherwood, J. Catal. 61, 378 (1980). https://doi.org/10.1016/0021-9517(80)90385-1
R. F. Fisher, M. D. Alvey, and P. M. George, J. Vac. Sci. Technol. A 10, 2253 (1992). https://doi.org/10.1116/1.577927
H. Wang and E. A. Carter, J. Am. Chem. Soc. 115, 2357 (1993). https://doi.org/10.1021/ja00059a034
C. D. Wagner, The NIST X-ray Photoelectron Spectroscopy (XPS) Database (Natl. Inst. Stand. Technol., Oakland, 1991). https://nvlpubs.nist.gov/nistpubs/Legacy/TN/nbstechnicalnote1289.pdf.
A. V. Naumkin, A. Kraut-Vass, S. W. Gaarenstroom, and C. J. Powell, NIST Standard Reference Database, Version 4.1 (2012). https://doi.org/10.18434/T4T88K
J.-Ch. Dupin, D. Gonbeau, P. Vinatier, et al., Phys. Chem. Chem. Phys. 2, 1319 (2000). https://doi.org/10.1039/A908800H
F. Huang, Z. Wan, Y. Jin, et al., J. Electrochem. Soc. B 164, 632 (2017). https://doi.org/10.1149/2.0641713jes
I. Bertóti, M. Mohai, A. Csanády, et al., Surf. Interface Anal. 19, 457 (1992). https://doi.org/10.1002/sia.740190186
ACKNOWLEDGMENTS
The authors are grateful to A.V. Ukhina, PhD for measuring X-ray diffraction patterns, to A.V. Utkin, PhD for his help in preparing carbide pellets, and to the Shared Facilities Center of the Institute of Catalysis, Siberian Branch of the Russian Academy of Sciences, for providing facilities for recording and processing XPS spectra.
Funding
The study was supported by the Russian Science Foundation (project no. 18-19-00075)
Author information
Authors and Affiliations
Corresponding author
Ethics declarations
The authors have no conflicts of interests to declare.
Additional information
Translated by O. Fedorova
Rights and permissions
About this article
Cite this article
Lozanov, V.V., Il’in, I.Y., Morozova, N.B. et al. Chemical Vapor Deposition of an Iridium Phase on Hafnium Carbide and Tantalum Carbide. Russ. J. Inorg. Chem. 65, 1781–1788 (2020). https://doi.org/10.1134/S0036023620110108
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S0036023620110108