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Carbon-based Multi-layered Films for Electronic Application: A Review

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Abstract

The current article reviews the construction of thin films comprising carbon-based nanomaterials for application in electrical and electronic fields. Carbon-based materials such as carbon nanotubes, graphene, and fullerene are known to possess excellent electrical and electronic properties, which makes them desirable materials for the fabrication of micro- and nano-electromechanical devices. The fabrication process of thin films, including the deposition of several layers, removal of layers, solution processing methods, inkjet printing, micro-emulsion polymerization methods, deposition through filtration processes, spin coating, dip coating, pen lithography, vacuum-assisted flocculation, vacuum-assisted layer-by-layer assembly laser writing, etc., has been extensively reviewed. It is evident from the past findings that the fabricated thin films constituting carbon nanomaterials shows predominant alteration in electrical and electronic properties like sheet resistance, ionic transport, potential difference, conductivity, electro-rheological, transparency, trans-conductance, transmittance, bending stability, etc. In view of the referred properties, the developed materials find wide applications in charge-trap flash memories, flexible organic resistive memory devices, photovoltaic devices, flexible and transparent electronics, heat sinks in electronic materials, liquid crystal displays (LCDs), thin-film solar cells, flexible touch-screen panels, electronic papers, micro-batteries, electrochemical micro-capacitors, humidity sensors, optoelectronic devices, etc. We expect that the current review article will be a valuable asset for the researchers working in the field of carbon nanomaterials.

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Abbreviations

ABS:

Poly(acrylonitrile-co-butadiene-co-styrene)

AFM:

Atomic force microscopy

AIBN:

Azobisisobutyronitrile

APCVD:

Ambient pressure chemical vapor deposition

ATR:

Attenuated total reflection

CA:

Cellulose acetate

C-AFM:

Conductive atomic force microscopy

CCS:

Confinement controlled sublimation

CH4 :

Methane

CMG:

Chemically modified graphene

CMOS:

Complementary metal–oxide–semiconductor

CNT:

Carbon nanotube

CRG:

Chemically reduced graphene sheets

CTF:

Charge-trap flash

CV:

Cyclic voltammetry

CVD:

Chemical vapor deposition

DI:

Deionized

d-LBL:

De-wetting layer by layer

DMF:

Dimethylformamide

DODA.Br:

Dimethyldioctadecylammonium bromide

DSSC:

Dye-sensitized solar cell

DVB:

Divinyl benzene

ECC_LBL:

Electrochemical coupling layer by layer

e-CMG:

Embossed CMG

EGO:

Exfoliated graphene oxide

EIS:

Electrochemical impedance spectroscopy

EISA:

Evaporation-induced self-assembly process

EPD:

Electrophoretic deposition

ER:

Electrorheological

ESR:

Equivalent series resistance

FET:

Field effect transistors

FF:

Fill factor

f-GNR:

Functionalized graphene nanoribbon

FGS:

Functionalized graphene sheets

FLG:

Few-layer graphene

fMWNTs:

Functionalized multi-walled carbon nanotubes

FTIR:

Fourier transform infrared spectroscopy

GCNT:

Graphitic carbon nanotube

GNR:

Graphene nanoribbon

GO:

Graphene oxide

GOP:

Graphene oxide paper

GP:

Graphene paper

GS:

Graphene nanosheets

GSMBE:

Gas source molecular beam epitaxy

HCl:

Hydrochloric acid

HOPG:

Highly oriented pyrolytic graphite

HRTEM:

High-resolution transmission electron microscopy

HTL:

Hole transporting layers

NADH:

Hydroxylamine reductase

IS-IL:

Imidazolium salt-based ionic liquid

ITO:

Indium tin oxide

LB:

Langmuir–Blodgett

LBL:

Layer by layer

LDH:

Lactate dehydrogenase

LIB:

Lithium-ion battery

M:

Molarity

MEMS:

Microelectromechanical systems

MLG:

Multilayer graphene

MWNT:

Multi-walled carbon nanotube

NaOH:

Sodium hydroxide

NEMS:

Nano-electromechanical systems

NG:

Nitrogen-doped graphene

NT:

Nanotube

OFET:

Organic field effect transistor

OM:

Optical microscopy

OPV:

Organic photovoltaic

ORR:

Oxygen reduction reaction

PAA:

Polyacrylic acid

PAH:

Poly(allylamine hydrochloride)

PAM:

Polyacrylamide

PAN:

Polyacrylonitrile

PANI:

Polyaniline

PCBM:

[6,6]-Phenyl-C61-butyric acid methyl ester

PCE:

Power conversion efficiency

PDAC:

Poly(diallyldimethylammoniumchloride)

PDDA:

Poly(dimethyldiallylammonium chloride)

PDMS:

Polydimethylsiloxane

PE:

Polyelectrolyte

PEDOT:

Poly(3,4-ethylenedioxythiophene)

PEI:

Poly(ethyleneimine)

PET:

Polyethylene terephthalate

PMMA:

Poly(methyl methacrylate)

PPE:

Polyphenyl ether

PS:

Polystyrene

PSS:

Poly(sodium 4-styrenesulfonate)

PV:

Photovoltaic

PVA:

Polyvinyl alcohol

RGO:

Reduced graphene oxide

RIE:

Reactive ion etching

RMGO:

Reduced multilayer graphene oxide

SAED:

Selected-area electron diffraction

SA-LBL:

Spin-assisted layer by layer

SAM:

Self-assembled monolayer

sccm:

Standard cubic centimeters per min

SDS:

Sodium dodecyl sulfate

SEM:

Scanning electron microscopy

SHG:

Self-assembled graphene hydrogels

SPS:

Sulfated polystyrene

SWNT:

Single-walled carbon nanotube

TCNT:

Tangled carbon nanotube

TEM:

Transmission electron microscopy

TFT:

Thin-film transistors

TGA:

Thermogravimetric analysis

THF:

Tetrahydrofuran

TMB:

Trimethylboron

UL-GO:

Ultralarge graphene oxide

UV:

Ultraviolet

VACNT:

Vertically aligned carbon nanotube

VASA:

Vacuum-assisted self-assembly

VAF:

Vacuum-assisted flocculation

VALBL:

Vacuum-assisted layer by layer

WORM:

Write once-read many

xGnPs:

Exfoliated graphite nanoplatelets

XPS:

X-ray photoelectron spectroscopy

XRD:

X-ray diffraction

PU:

Polyurethane

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Authors and Affiliations

  1. Department of Mechanical Engineering, Kongu Engineering College, Erode, Tamilnadu, India

    Rajasekar Rathanasamy & Santhosh Sivaraj

  2. Department of Chemistry, Madanapalle Institute of Technology and Science, Madanapalle, Andhra Pradesh, India

    Sumanta Sahoo & Ashok Kumar Das

  3. BIN Convergence Technology, Chonbuk National University, Jeonju, South Korea

    Joong Hee Lee

  4. Department of Mechatronics Engineering, Kongu Polytechnic College, Erode, Tamilnadu, India

    Mahalakshmi Somasundaram

  5. Department of Mining Engineering, Indian Institute of Technology Kharagpur, Kharagpur, India

    Sathish Kumar Palaniappan

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  1. Rajasekar Rathanasamy
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  2. Sumanta Sahoo
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  3. Joong Hee Lee
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  4. Ashok Kumar Das
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  5. Mahalakshmi Somasundaram
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  6. Sathish Kumar Palaniappan
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  7. Santhosh Sivaraj
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Correspondence to Sumanta Sahoo.

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Rathanasamy, R., Sahoo, S., Lee, J.H. et al. Carbon-based Multi-layered Films for Electronic Application: A Review. J. Electron. Mater. 50, 1845–1892 (2021). https://doi.org/10.1007/s11664-020-08724-4

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