Abstract
We have explored the effects of various processing parameters on the dielectric andelectronic integrity of sol-gel derived silicate thin films and have identified several factors that strongly affect the thin film electronic properties. We find that sol-gel dielectrics can exhibit excellent dielectric integrity: viz., low interface trap densities and fairly good insulating properties approaching those of a thermally grown SiO2 film on Si.
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References
K. P. Pande and D. Gutierrez, Appl. Phys. Lett., 46, 416 (1985).
J. Batey and E. Tierney, J. Appl. Phys., 60, 3136 (1986).
P. G. LeComber and W. E. Spear, Seminconductors and Semimetals, D21, 89 (1984).
J. Lee, I-C Chen and C. Hu, IEEE Electron. Dev. Lett., 506 (1986).
C. J. Brinker, K. D. Keefer, D. W. Schafer, R. A. Assink, B. D. Kay and C. S. Ashley, J. Non Cryst. Solids, 63, 45 (1984).
K. D. Keefer in Better Ceramics Through Chemistry, Materials Research Society Sym. Proa, Vol. 32, eds. C. J. Brinker, D. E. Clark and D. R. Ulrich (North Holland, Amsterdam, 1984) p. 15.
C. J. Brinker, A. J. Hurd and K. J. Ward, Ultrastructure Processing of Advanced Ceramics, (Wiley, NY, 1988) p. 223.
D. W. Schafer, J. E. Martin, K. J. Ward and K. D. Keefer, in Physics of Finely Divided Matter, ed. by N. Boceara and M. Daoud (Springer-Verlag, Berlin, 1985) p. 13.
S. Sakka, K. Kamiya, K. Makita, and Y. Yamamoto, J. Non Cryst. Solids, 63, 223 (1984).
L. M. Terman, Solid State Electron, 5, 289 (1962).
E. H. Nicollian and J. R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology, (Wiley, NY, 1981) p. 800.
Z. A. Weinberg, W. C. Johnson and M. A. Lampert, J. Appl. Phys., 47, 248 (1976).
W. A. Pliskin and H. S. Lehman, J. Electrochem Soc., 112, 1013 (1965).
G. Lucovsky, M. J. Manitini, J. K. Srivastava and E. A. Irene, J. Vac. Sci. Tech., B5, 530 (1987).
C. J. Brinker, K. D. Keefer, D. W. Schafer and C. S. Ashley, J. Non Cryst. Solids, 48, 47 (1982).
A. J. Hurd and C. J. Brinker, Mat. Res. Soc. Sym. Proc., Vol. 121, p. 731 (1988).
C. J. Brinker, A. J. Hurd, D. R. Tallant and C. S. Ashley, submitted to Thin Solid Films.
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Warren, W.L., Lenahan, P.M., Brinker, C.J. et al. Sol-Gel Thin Film Electronic Properties. MRS Online Proceedings Library 180, 413 (1990). https://doi.org/10.1557/PROC-180-413
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DOI: https://doi.org/10.1557/PROC-180-413