Skip to main content
Log in

Sol-Gel Thin Film Electronic Properties

  • Articles
  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

We have explored the effects of various processing parameters on the dielectric andelectronic integrity of sol-gel derived silicate thin films and have identified several factors that strongly affect the thin film electronic properties. We find that sol-gel dielectrics can exhibit excellent dielectric integrity: viz., low interface trap densities and fairly good insulating properties approaching those of a thermally grown SiO2 film on Si.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. K. P. Pande and D. Gutierrez, Appl. Phys. Lett., 46, 416 (1985).

    Article  CAS  Google Scholar 

  2. J. Batey and E. Tierney, J. Appl. Phys., 60, 3136 (1986).

    Article  CAS  Google Scholar 

  3. P. G. LeComber and W. E. Spear, Seminconductors and Semimetals, D21, 89 (1984).

    Article  Google Scholar 

  4. J. Lee, I-C Chen and C. Hu, IEEE Electron. Dev. Lett., 506 (1986).

  5. C. J. Brinker, K. D. Keefer, D. W. Schafer, R. A. Assink, B. D. Kay and C. S. Ashley, J. Non Cryst. Solids, 63, 45 (1984).

    Article  CAS  Google Scholar 

  6. K. D. Keefer in Better Ceramics Through Chemistry, Materials Research Society Sym. Proa, Vol. 32, eds. C. J. Brinker, D. E. Clark and D. R. Ulrich (North Holland, Amsterdam, 1984) p. 15.

    Google Scholar 

  7. C. J. Brinker, A. J. Hurd and K. J. Ward, Ultrastructure Processing of Advanced Ceramics, (Wiley, NY, 1988) p. 223.

    Google Scholar 

  8. D. W. Schafer, J. E. Martin, K. J. Ward and K. D. Keefer, in Physics of Finely Divided Matter, ed. by N. Boceara and M. Daoud (Springer-Verlag, Berlin, 1985) p. 13.

    Google Scholar 

  9. S. Sakka, K. Kamiya, K. Makita, and Y. Yamamoto, J. Non Cryst. Solids, 63, 223 (1984).

    Article  CAS  Google Scholar 

  10. L. M. Terman, Solid State Electron, 5, 289 (1962).

    Article  Google Scholar 

  11. E. H. Nicollian and J. R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology, (Wiley, NY, 1981) p. 800.

    Google Scholar 

  12. Z. A. Weinberg, W. C. Johnson and M. A. Lampert, J. Appl. Phys., 47, 248 (1976).

    Article  CAS  Google Scholar 

  13. W. A. Pliskin and H. S. Lehman, J. Electrochem Soc., 112, 1013 (1965).

    Article  CAS  Google Scholar 

  14. G. Lucovsky, M. J. Manitini, J. K. Srivastava and E. A. Irene, J. Vac. Sci. Tech., B5, 530 (1987).

    Article  Google Scholar 

  15. C. J. Brinker, K. D. Keefer, D. W. Schafer and C. S. Ashley, J. Non Cryst. Solids, 48, 47 (1982).

    Article  CAS  Google Scholar 

  16. A. J. Hurd and C. J. Brinker, Mat. Res. Soc. Sym. Proc., Vol. 121, p. 731 (1988).

    Article  CAS  Google Scholar 

  17. C. J. Brinker, A. J. Hurd, D. R. Tallant and C. S. Ashley, submitted to Thin Solid Films.

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Warren, W.L., Lenahan, P.M., Brinker, C.J. et al. Sol-Gel Thin Film Electronic Properties. MRS Online Proceedings Library 180, 413 (1990). https://doi.org/10.1557/PROC-180-413

Download citation

  • Published:

  • DOI: https://doi.org/10.1557/PROC-180-413

Navigation