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Large Area Photochemical Dry Etching of Polymers with Incoherent Excimer UV Radiation

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Abstract

Photochemical dry etching and surface modification of different polymers, e.g., poly-methylmethacrylate (PMMA), polyimid (PI) and poly-ethylene terephthalate (PET) was achieved with an incoherent excimer UV source. Decomposition and etch rates of PMMA were determined as a function of UV intensity and exposure time at different wavelengths {ie39-1} {ie39-2} {ie39-3}. The morphology of the exposed area of PMMA was investigated with SEM. The etching of the polymers can be explained as a result of extensive photooxidation. The results are compared with data obtained from mercury lamp and excimer laser experiments.

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Acknowledgement

The authors would like to thank Dr.J.Demny and U.Feller for SEM investigations.

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Authors and Affiliations

  1. Asea Brown Boveri AG, Corporate Research, W-6900, Heidelberg, Germany

    Hilmar Esrom, Jun-Ying Zhang & Ulrich Kogelschatz

  2. CH-5405, Baden, Switzerland

    Ulrich Kogelschatz

Authors
  1. Hilmar Esrom
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  2. Jun-Ying Zhang
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  3. Ulrich Kogelschatz
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Esrom, H., Zhang, JY. & Kogelschatz, U. Large Area Photochemical Dry Etching of Polymers with Incoherent Excimer UV Radiation. MRS Online Proceedings Library 236, 39–45 (1991). https://doi.org/10.1557/PROC-236-39

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  • DOI: https://doi.org/10.1557/PROC-236-39

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