Abstract
Three new methods for dry etching of copper at temperatures below 200°C have been developed. The first relies on the formation of volatile CICu(PR3)2 species via reaction of PR3 with CuCI where R = ethyl, and butyl. The second relies on the reaction of Cu(hfac)2 and neutral ligands L such as butyne, pentyne or bistrimethylsilylacetylene to form (hfac)CuL. The last approach involves reaction of CuO with hexafluoroacetylacetone (hfacH) to form Cu(hfac)2 and water. These approaches have provided etch rates as high as 1 μm/min at 150°C.
Similar content being viewed by others
References
P.C. Pai, C.H. Ting, in VLSI V, (Mater. Res. Soc. Symp. Proc. 1990) p. 359.
H.K. Shin, M.J. Hampden-Smith, T.T. Kodas, and E.N. Duesler in Chemical Perspectives of Electronic Materials II, (Mat. Res. Soc. Symp.Proc., 204, 1991) p. 61
H.K. Shin, K.M. Chi, M. Hampden-Smith, T.T. Kodas, J. Farr, and M. Paffett, Angew. Chem., Advanced Materials, 3, 246, (1991).
H. F. Winters, J. Vac. Sci. Technol. A3, 786 (1985).
W. Sesselmann, T. J. Chuang, Surface Sci. 176, 32, (1986).
W. Sesselmann, T. J. Chuang, Surface Sci. 176, 67, (1986).
S. Broydo, Solid State Technol., 26, 159, (1983).
P. Gulde, C. Scholtz, U.S. Patent No. 4 838 994, (June 13, 1989).
G.C. Schwartz, P.M. Schaible, J. Electrochem. Soc. 130, 1777 (1983).
P.M. Schaible, G.C. Schwartz, U.S. Patent No. 4 352 716 (1982).
B. J. Howard, S.K. Wolterman, W.J. Yoo, B. Gittleman, and C.H. Steinbruchel in Surface Chemistry and Beam-Solid Interactions. (Mat. Res. Soc. Symp. Proc., 201, 1991) p. 129.
F. Druschke, G. Kraus, U. Kuenzel, W. D. Ruth, R. Schaefer; U.S. Patent No. 4 557 796, (December 10, 1985).
R. C. Bausmith, W. J. Cote, J. C. Cronin, K. L. Holland, C. W. Kaanta, P. P. Lee, T. M. Wright; U.S. Patent No. 4 919 750 (April 24, 1990).
A. T. J. Norman, B.A. Muratore, P.N. Dyer, D. A. Roberts, A.K. Hochberg, J. de Physique, to be published (1992).
F. Rousseau, A. Jain, M. J. Hampden-Smith, T. T. Kodas, Chem. Mater., submitted for publication, 1992.
Acknowledgement
TTK acknowledges the support of a National Science Foundation Presidential Young Investigator Grant #CTS-9059538. MHS thanks the NSF chemical instrumentation program for purchase of a low field NMR spectrometer.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Farkas, J., Rousseau, F., Chi, KM. et al. Dry Etching of Copper at High Rates. MRS Online Proceedings Library 236, 507–510 (1991). https://doi.org/10.1557/PROC-236-507
Published:
Issue Date:
DOI: https://doi.org/10.1557/PROC-236-507