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Total Reflection X-Ray Fluorescence (TXRF)

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Abstract

Total reflection X-Ray Fluorescence (TXRF) is a glancing x-ray analytical technique which is used primarily to measure surface metal contamination on semiconductor substrates. This is a review of Total reflection X-Ray Fluorescence (TXRF) applications for silicon semiconductor processing. In addition, some comments are made about the future of TXRF, and in particular, synchrotron radiation TXRF (SR-TXRF)

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Hockett, R.S. Total Reflection X-Ray Fluorescence (TXRF). MRS Online Proceedings Library 354, 377–388 (1994). https://doi.org/10.1557/PROC-354-377

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