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The Gas Field Ion Source for Finely Focused Ion Beam Systems

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Abstract

The Gas Field Ion Source, GFIS, promises a 109A/(cm2 str) brightness, small beam sizes, and inert gas ion species. If this performance could be demonstrated on a commercial system, the GFIS might replace the liquid metal ion source as the standard source for FIB applications. Recent work at the Max-Planck-Institut für Kernphysik (MPI-K) in Heidelberg, Germany has shown that a GFIS with a ‘Super Tipped’ emitter can be reliably fabricated and can be run with stable helium beam current for more than 200 hours. However, this GFIS source must operate in a bakable UHV chamber, at cryogenic temperatures, and at high voltages with low vibration. A GFIS is now being integrated with high resolution ion optics and a vacuum chamber designed for studying GFIS image quality and ion induced chemistry.

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References

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Authors and Affiliations

  1. Micrion Corporation, One Corporation Way, Peabody, MA, 01960, USA

    W. Thompson, A. Armstrong, S. Etchin, R. Percival & A. Saxonis

Authors
  1. W. Thompson
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  2. A. Armstrong
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  3. S. Etchin
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  4. R. Percival
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  5. A. Saxonis
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Correspondence to W. Thompson.

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Thompson, W., Armstrong, A., Etchin, S. et al. The Gas Field Ion Source for Finely Focused Ion Beam Systems. MRS Online Proceedings Library 396, 687 (1995). https://doi.org/10.1557/PROC-396-687

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  • DOI: https://doi.org/10.1557/PROC-396-687

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