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Nano-Scale Heteroepitaxy Control of Magnetic Oxide Thin Films on Ultra-Smooth Sapphire Substrates

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Abstract

We have examined the novel heteroepitaxy of magnetic oxide thin films on ultra-smooth sapphire substrates by laser MBE for fabrication of low-dimensional structures. Employing the atomically controlled substrate surfaces with atomic steps and terraces, we demonstrate the deposition of magnetic oxide nanowires (~0.5 nm high and ~20 nm wide) and nanodots of (Mn, Zn) ferrite, Fe3O4 and NiO.

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Authors and Affiliations

  1. Ceramics Materials & Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama, 226-8503, Japan

    Masahiro Takakura, Takafumi Miyahara, Junichi Tashiro, Atsushi Sasaki & Mitsuyasu Furusawa

  2. Ceramics Materials & Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama, 226-8503, Japan

    Mamoru Yoshimoto

Authors
  1. Masahiro Takakura
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  2. Takafumi Miyahara
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  3. Junichi Tashiro
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  4. Atsushi Sasaki
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  5. Mitsuyasu Furusawa
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  6. Mamoru Yoshimoto
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Correspondence to Mamoru Yoshimoto.

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Takakura, M., Miyahara, T., Tashiro, J. et al. Nano-Scale Heteroepitaxy Control of Magnetic Oxide Thin Films on Ultra-Smooth Sapphire Substrates. MRS Online Proceedings Library 648, 65 (2000). https://doi.org/10.1557/PROC-648-P6.5

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  • DOI: https://doi.org/10.1557/PROC-648-P6.5

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