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Interference lithography for 3D photonic band gap crystal layer by layer fabrication

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Abstract

We present fabrication of 3D photonic band gap woodpile crystals from photosensitive chalcogenide glass with the help of interference lithography and layer by layer construction. The alignment method is described, which is scalable to extremely small feature sizes required for photonic crystals in the visible region.

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Authors and Affiliations

  1. Electro-Optics Division, NRC Soreq, 81800, Yavne, Israel

    A. Feigel, Z. Kotler & B. Sfez

  2. Physics Dept, Ben-Gurion University, 84105, Beer-Sheva, Israel

    A. Arsh, M. Klebanov & V. Lyubin

Authors
  1. A. Feigel
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  2. Z. Kotler
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  3. B. Sfez
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  4. A. Arsh
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  5. M. Klebanov
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  6. V. Lyubin
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Feigel, A., Kotler, Z., Sfez, B. et al. Interference lithography for 3D photonic band gap crystal layer by layer fabrication. MRS Online Proceedings Library 692, 291 (2001). https://doi.org/10.1557/PROC-692-K2.9.1

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  • DOI: https://doi.org/10.1557/PROC-692-K2.9.1

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