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A Study of APCVD-Deposited TiO2Characteristics in the Structure of a Tunneling Transistor

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Abstract

TiO2 and nickel-silicide layers are consequently deposited and micro machined to compose a mesa-structured tunneling transistor. The depositions are done with the RF-sputtering method and the electrical and physical characteristics of the products are investigated. Transistors show an amplification coefficient of about 20. To improve the quality and coverage of the TiO2 layer, the oxide deposition is made by means of an APCVD reactor. The grown oxide shows a dielectric coefficient between 19 and 21 and its breakdown field is about 107 V/cm.

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Authors and Affiliations

  1. Department of Electrical and Computer Engineering, Thin Film laboratory, University of Tehran, Tehran, Iran

    A. Behnam, B. Hekmatshoar, S. Mohajerzadeh, B. Arvan, F. Karbassian & A. Khakifirooz

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  1. A. Behnam
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  2. B. Hekmatshoar
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  3. S. Mohajerzadeh
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  4. B. Arvan
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  5. F. Karbassian
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  6. A. Khakifirooz
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Behnam, A., Hekmatshoar, B., Mohajerzadeh, S. et al. A Study of APCVD-Deposited TiO2Characteristics in the Structure of a Tunneling Transistor. MRS Online Proceedings Library 811, 203–207 (2003). https://doi.org/10.1557/PROC-811-D3.9

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  • DOI: https://doi.org/10.1557/PROC-811-D3.9

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