Skip to main content
Log in

Effect of Temperature on Incubation Time for Spontaneous Morphology Change in Electrodeposited Copper Metallization

  • Article
  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

A systematic investigation of the effect of annealing time and temperature on the incubation period for spontaneous morphology change (SMC) in electrodeposited copper metallization is reported. The incubation time is greatly reduced at higher temperatures. At each temperature, the remaining incubation time at room temperature was found to decrease approximately linearly with increasing annealing time. An Arhennius plot of the measured rates of decrease showed good linearity and yielded a value of 0.48 eV for the activation energy. This is consistent with a vacancy diffusion mechanism for the process occurring during the incubation period and supports our proposed mechanism for SMC.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. W. U. Schmidt, R. C. Alkire and A. A. Gewirth, J.Electrochem. Soc., 143, 3122 (1996)

    Article  CAS  Google Scholar 

  2. J.M.E. Harper and K.P. Rodbell, J. Vac. Sci. Technol. B15, 763 (1997)

    Article  Google Scholar 

  3. M. Dietterle, T. Will and D. M. Kolb, Surface Science, 396, 189 (1998)

    Article  CAS  Google Scholar 

  4. G.R. Stafford, M.D. Vaudin, T.P. Moffat, N. Armstrong, V.D. Jovic and D.R. Kelley, Electrochemical Soc. Proceedings, Vol. 99–34, p. 340 (1999)

    Google Scholar 

  5. M. Cerisier, K. Attenborough, J. Fransaer, C. V. Haesendonck and J. P. Celis, J.Electrochem. Soc., 146, 2156 (1999)

    Article  CAS  Google Scholar 

  6. T. Y. B. Leung, M. Kang, B. F. Corry and A. A. Gewirth, J. Electrochem. Soc., 147, 3326 (2000).

    Article  Google Scholar 

  7. T. P. Moffat, J. E. Bonevich, W. H. Huber, A. Stanishevsky, D. R. Kelly, G. R. Stafford and D. Josell, J.Electrochem. Soc., 147, 4524 (2000).

    Article  CAS  Google Scholar 

  8. A. A. Rasmussen, J. A. D. Jensen, A. Horsewell and M. A. J. Somers, Electrochim. Acta, 47, 67 (2001)

    Article  CAS  Google Scholar 

  9. J.W. Patten, E.D. McClanahan, and J.W. Johnston, J. Appl. Phys., 42, 4371 (1971)

    Article  CAS  Google Scholar 

  10. I.V. Tomov, D.S. Stoychev, and I.B. Vitanova, J. Appl. Electrochem., 15, 887 (1985)

    Article  CAS  Google Scholar 

  11. D.S. Stoychev, I.V. Tomov, and I.B. Vitanova, J.Appl. Electrochem. 15, 879 (1985)

    Article  Google Scholar 

  12. T. Titzdorf, L. Craham, S. Jin, C. Mu and D. Fraser, Proc. Int, Interconnect. Technol, Conf. p. 166 (1998)

  13. C. Lingk and M.E. Gross, J. Appl. Phys., 84, 5547 (1998)

    Article  CAS  Google Scholar 

  14. M.E. Gross, C. Lingk, T. Siegrist, E. Coleman, W.L. Brown, K. Ueno, Y. Tsuchiya, N. Itoh, T. Ritzdorf, J. Turner, K. Gibbons, E. Klawuhn, M. Biberger, W.Y.C. Lai, J.F. Miner, G. Wu, and F. Zhang, Mat. Res. Soc. Symp. Proc. 514, 293 (1998)

    Article  CAS  Google Scholar 

  15. J.M.E. Harper, C. Cabral Jr., P.C. Andricacos, L. Gignac, I.C. Noyan, K.P. Rodbell, and C.K. Hu, J. Appl. Phys., 86, 2516, (1999)

    Article  CAS  Google Scholar 

  16. D. Walther, M.E. Gross, K Evans-Lutterodt, W.L. Brown, M.Oh, S. Merchant and P. Naresh, Mat. Res. Symp. Proc., Vol. 612, p. D10.1.1. (2000)

    Article  Google Scholar 

  17. S. Lagrange, S.H. Brongersma, M. Judeleiviez, A. Saerens, I Vervoort, E. Richards, B. Palmans and K. Marx, Microelectronic Engineering, 50, 449 (2000)

    Article  CAS  Google Scholar 

  18. W.H.Teh, L.T. Koh, S.M. Chem, J. Xie, C.Y. Li and P.D. Foo, Microelectronics Journal, 32, 579 (2001)

    Article  CAS  Google Scholar 

  19. D. N. Buckley and S. Ahmed, Electrochem. Solid State Lett., 6, C33–C37 (2003)

    Article  CAS  Google Scholar 

  20. S. Ahmed and D.N. Buckley in Proceedings of the Symposium on Copper Interconnects, New Contact Metallurgies and Low-k Interlevel Dielectrics (The Electrochemical Society, Pennington, NJ, 2002).

  21. R. J. Nichols, E. Bunge, H. Meyer and H. Baumgärtel, Surface Science, 335, 110 (1995).

    Article  CAS  Google Scholar 

  22. M. Cerisier, C. V. Haesendonck and J. P. Celis, J.Electrochem. Soc., 146, 1829 (1999)

    Article  CAS  Google Scholar 

  23. S. Ahmed and D. N. Buckley, Abstract No. 163, 205th Meeting of The Electrochemical Society, San Antonio, Texas, May 9–13, 2004

  24. S. Nakahara, S. Ahmed, and D. N. Buckley, Abstract No. 913, 206th Meeting of The Electrochemical Society, Honolulu, Hawaii, October 3–8, 2004.

  25. Y. Fujiki, J. Phys. Soc. Japan 14, 1308 (1959).

    Article  CAS  Google Scholar 

  26. L. Tewordt, Phys. Rev. 109, 61 (1958).

    Article  CAS  Google Scholar 

  27. H. Kimura, R. Maddin, and D. Kuhlmann-Wilsdorf, Acta Met. 7, 145 (1959).

    Article  CAS  Google Scholar 

  28. W. Schüle, A. Seeger, D. Schumacher, and K. King, Phys. Stat. Sol. 2, 1199 (1962).

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Ahmed, S., Buckley, D.N., Nakahara, S. et al. Effect of Temperature on Incubation Time for Spontaneous Morphology Change in Electrodeposited Copper Metallization. MRS Online Proceedings Library 863, B5.4 (2004). https://doi.org/10.1557/PROC-863-B5.4

Download citation

  • Published:

  • DOI: https://doi.org/10.1557/PROC-863-B5.4

Navigation