Skip to main content
SpringerLink
Log in

O12.6 Fracture and Deformation of Thermal Oxide Films on Si (100) Using a Femtosecond Pulsed Laser

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

Femtosecond pulsed laser damage of Silicon (100) with thermal oxide thin films was studied in order to further understand the optical and electrical properties of thin films and to evaluate their influence on the damage of the substrate. The damage threshold as a function of film thickness (2 – 1200 nm) was measured. The damage morphology produced by single laser pulses was also investigated. Two primary morphologies were observed, one in which the oxide film is completely removed, and the other in which the film is delaminated and expanded above the surface producing a bubble feature.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. J. Bonse et al., Appl. Phys. A - Mat. Sci. & Proc. 74, p19 (2002).

    Article  CAS  Google Scholar 

  2. C. B. Schaffer et al., Meas. Sci. & Tech. 12, p1784 (2001).

    Article  CAS  Google Scholar 

  3. D. Du et al., Appl. Phys. Lett. 64, p3071 (1994).

    Article  Google Scholar 

  4. Ke Xiao et al., Appl. Phys. Lett., 85, p1934 (2004).

    Article  CAS  Google Scholar 

  5. J. Bonse et al., Appl. Surf. Science, 154-155, p659 (2000).

    Google Scholar 

  6. A. Kucirkova et al., Appl. Spectrosc., 48, p113 (1994).

    Article  CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Applied Physics Program, University of Michigan, 2477 Randall Laboratory, 48109-1120, Ann Arbor, MI, USA

    Joel P. McDonald

  2. College of Engineering, University of Michigan, Lurie Engineering Center, 1221 Beal Avenue, 48109-2102, Ann Arbor, MI, USA

    Vanita R. Mistry & Katherine E. Ray

  3. Deparment of Materials Science and Engineering, University of Michigan, 2200 Hayward Ave., 48109, Ann Arbor, MI, USA

    Steven M. Yalisove

  4. Center for Ultrafast Optical Science, University of Michigan, 1006 Gerstacker Building, 2200 Bonisteel Avenue, 48109, Ann Arbor, MI, USA

    Joel P. McDonald & Steven M. Yalisove

Authors
  1. Joel P. McDonald
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Vanita R. Mistry
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Katherine E. Ray
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Steven M. Yalisove
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

McDonald, J.P., Mistry, V.R., Ray, K.E. et al. O12.6 Fracture and Deformation of Thermal Oxide Films on Si (100) Using a Femtosecond Pulsed Laser. MRS Online Proceedings Library 875, 126 (2005). https://doi.org/10.1557/PROC-875-O12.6

Download citation

  • Published:

  • DOI: https://doi.org/10.1557/PROC-875-O12.6

Search

Navigation