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Impact of interface thermodynamics on Al-induced crystallization of amorphous SixGe1–x alloys

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Abstract

Al-induced crystallization (AIC) of amorphous SixGe1–x (a-SixGe1–x) alloys with compositions over the entire range of the isomorphous Si–Ge system has been investigated. The crystallization progress was monitored by dedicated in situ x-ray diffraction analysis while gradually increasing the annealing temperature. Auger sputter-depth profiling was applied to investigate the occurrence of Al-induced layer exchange of the Al and a-SixGe1–x sublayers after complete crystallization. A-SixGe1–x alloys with x < 0.13 and x > 0.41 show largely different AIC behaviors with respect to crystallization rate and possible layer exchange of the Al and a-SixGe1–x sublayers upon crystallization. A thermodynamic model for AIC of a-SixGe1–x alloys is presented, which well explains these experimental observations and thereby demonstrates the dominant role of interface thermodynamics in the AIC process of amorphous semiconductors. The model can be used to predict the AIC behaviors of a-SixGe1–x alloys over the entire composition range at specified annealing temperatures.

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REFERENCES

  1. C. Eisele, M. Berger, M. Nerding, H.P. Strunk, and C.E. Nebel: Laser-crystallized microcrystalline SiGe alloys for thin film solar cells. Thin Solid Films 427, 176 (2003).

    Article  CAS  Google Scholar 

  2. I. Gordon, L. Carnel, D. Van Gestel, G. Beaucarne, and J. Poortmans: 8% Efficient thin-film polycrystalline-silicon solar cells based on aluminum-induced crystallization and thermal CVD. Prog. Photovolt.: Res. Appl. 15, 575 (2007).

    Article  CAS  Google Scholar 

  3. M. Miyao, H. Kanno, and T. Sadoh: Electric field assisted low-temperature growth of SiGe on insulating films for future TFT. Edited by W. Shen and J. Chu. In Proceedings of SPIE (Thin Film Physics and Applications, Sixth International Conference), Vol. 6984, L9840, (SPIE-INT SOC OPTICAL ENGINEERING, Shanghai, China, 2008).

    Google Scholar 

  4. S. Zhao, Z. Meng, M. Wong, and H-S. Kwok: Metal-induced continuous zonal domain (CZD) polycrystalline silicon thin-film transistors and its application on field sequential color liquid crystal display. J. Disp. Technol. 6, 135 (2010).

    Article  Google Scholar 

  5. S. Yamaguchi, N. Sugii, S.K. Park, K. Nakagawa, and M. Miyao: Solid-phase crystallization of Si1-xGex alloy layers. J. Appl. Phys. 89, 2091 (2001).

    Article  CAS  Google Scholar 

  6. Z. Wang, L.P.H. Juergens, J.Y. Wang, and E.J. Mittemeijer: Fundamentals of metal-induced crystallization of amorphous semiconductors. Adv. Eng. Mater. 11, 131 (2009).

    Article  CAS  Google Scholar 

  7. C. Spinella, S. Lombardo, and F. Priolo: Crystal grain nucleation in amorphous silicon. Appl. Phys. Rev. 84, 5383 (1998).

    Article  CAS  Google Scholar 

  8. W. Knaepen, C. Detavernier, R.L. Van-Meirhaeghe, J.J. Sweet, and C. Lavoie: In situ x-ray diffraction study of metal induced crystallization of amorphous silicon. Thin Solid Films 516, 4946 (2008).

    Article  CAS  Google Scholar 

  9. W. Knaepen, S. Gaudet, C. Detavernier, R.L. Van-Meirhaeghe, and J.J. Sweet: In situ x-ray diffraction study of metal induced crystallization of amorphous germanium. J. Appl. Phys. 105, 083532 (2009).

    Article  Google Scholar 

  10. M. Gjukic, M. Buschbeck, R. Lechner, and M. Stutzmann: Aluminum-induced crystallization of amorphous silicon-germanium thin films. Appl. Phys. Lett. 85, 2134 (2004).

    Article  CAS  Google Scholar 

  11. R. Lechner, M. Buschbeck, M. Gjukic, and M. Stutzmann: Thin polycrystalline SiGe films by aluminium-induced layer exchange. Phys. Status Solidi C 1, 1131 (2004).

    Article  CAS  Google Scholar 

  12. T. Iwasa, T. Kaneko, I. Nakamura, and M. Isomura: Polycrystalline silicon germanium thin films prepared by aluminum-induced crystallization. Phys. Status Solidi A 207, 617 (2010).

    Article  CAS  Google Scholar 

  13. M. Kurosawa, Y. Tsumura, T. Sadoh, and M. Miyao: Ge fraction dependence of Al-induced crystallization of SiGe at low temperatures. J. Korean Phys. Soc. 54, 451 (2009).

    Article  CAS  Google Scholar 

  14. M. Kurosawa, Y. Tsumura, T. Sadoh, and M. Miyao: Interfacial-oxide layer controlled Al-induced crystallization of Si1−xGex (x: 0–1) on insulating substrate. Jpn. J. Appl. Phys. 48, 03B002 (2009).

    Article  Google Scholar 

  15. M. Kurosawa, T. Sadoh, and M. Miyao: Al-induced low-temperature crystallization of Si1−xGex (0<x<1) by controlling layer exchange process. Thin Solid Films 518, S174 (2010).

    Article  CAS  Google Scholar 

  16. M. Kurosawa, N. Kawabata, T. Sadoh, and M. Miyao: Enhanced interfacial-nucleation in Al-induced crystallization for (111) oriented Si1−xGex (0≤x≤1) films on insulating substrates. ECS J. Solid State Sci. Technol. 1, P144 (2012).

    Article  CAS  Google Scholar 

  17. T.W. Zhang, F. Ma, W.L. Zhang, D.Y. Ma, and K.W. Xu: Diffusion-controlled formation mechanism of dual-phase structure during Al induced crystallization of SiGe. Appl. Phys. Lett. 100, 071908 (2012).

    Article  Google Scholar 

  18. Z. Wang, J.Y. Wang, L.P.H. Jeurgens, and E.J. Mittemeijer: Thermodynamics and mechanism of metal-induced crystallization in immiscible alloy systems: Experiments and calculations on Al/a-Ge and Al/a-Si bilayers. Phys. Rev. B 77, 045424 (2008).

    Article  Google Scholar 

  19. B. Li, B. Zheng, S.Y. Zhang, and Z.Q. Wu: Dependence of fractal formation on the thickness ratio in Al/a-Ge bilayers. Phys. Rev. B: Condens. Matter 47, 3638 (1993).

    Article  CAS  Google Scholar 

  20. F. Katsuki, K. Hanafusa, M. Yonemura, T. Koyama, and M. Doi: Crystallization of amorphous germanium in an Al/a-Ge bilayer film deposited on a SiO2 substrate. J. Appl. Phys. 89, 4643 (2001).

    Article  CAS  Google Scholar 

  21. T.J. Konno and R. Sinclair: Crystallization of silicon in aluminium/amorphous-silicon multilayers. Philos. Mag. Part B 66, 749 (1992).

    Article  CAS  Google Scholar 

  22. J.Y. Wang, D. He, Y.H. Zhao, and E.J. Mittemeijer: Wetting and crystallization at grain boundaries: Origin of aluminum-induced crystallization of amorphous silicon. Appl. Phys. Lett. 88, 061910 (2006).

    Article  Google Scholar 

  23. Z. Wang, L. Gu, F. Phillipp, J.Y. Wang, L.P.H. Jeurgens, and E.J. Mittemeijer: Metal-catalyzed growth of semiconductor nanostructures without solubility and diffusivity constraints. Adv. Mater. 23, 854 (2011).

    Article  CAS  Google Scholar 

  24. M. Wohlschlogel, U. Welzel, G. Maier, and E.J. Mittemeijer: Calibration of a heating/cooling chamber for x-ray diffraction measurements of mechanical stress and crystallographic texture. J. Appl. Crystallogr. 39, 194 (2006).

    Article  Google Scholar 

  25. E.J. Mittemeijer and R. Delhez: Concentration variations within small crystallites studied by x-ray-diffraction line-profile analysis. J. Appl. Phys. 49, 3875 (1978).

    Article  CAS  Google Scholar 

  26. A. Leineweber and E.J. Mittemeijer: Notes on the order-of-reflection dependence of microstrain broadening. J. Appl. Crystallogr. 43, 981 (2010).

    Article  CAS  Google Scholar 

  27. Z.M. Wang, J.Y. Wang, L.P.H. Jeurgens, and E.J. Mittemeijer: “Explosive” crystallisation of amorphous germanium in Ge/Al layer systems; comparison with Si/Al layer systems. Scr. Mater. 55, 987 (2006).

    Article  CAS  Google Scholar 

  28. D. He, J.Y. Wang, and E.J. Mittemeijer: Reaction between amorphous Si and crystalline Al in Al/Si and Si/Al bilayers: Microstructural and thermodynamic analysis of layer exchange. Appl. Phys. A: Mater. Sci. Process. 80, 501 (2005).

    Article  CAS  Google Scholar 

  29. J.Y. Wang, Z. Wang, and E.J. Mittemeijer: Mechanism of aluminum-induced layer exchange upon low-temperature annealing of amorphous Si/polycrystalline Al bilayers. J. Appl. Phys. 102, 113523 (2007).

    Article  Google Scholar 

  30. Z. Wang, L. Gu, L.P.H. Jeurgens, F. Phillipp, and E.J. Mittemeijer: Real-time visualization of convective transportation of solid materials at nanoscale. Nano Lett. 12, 6126 (2012).

    Article  CAS  Google Scholar 

  31. A. Hiraki: Low temperature reactions at Si/metal interfaces; What is going on at the interfaces? Surf. Sci. Rep. 3, 357 (1983).

    Article  CAS  Google Scholar 

  32. R. Benedictus, A. Bottger, and E.J. Mittemeijer: Thermodynamic model for solid-state amorphization in binary systems at interfaces and grain boundaries. Phys. Rev. B: Condens. Matter 54, 9109 (1996).

    Article  CAS  Google Scholar 

  33. L.P.H. Jeurgens, Z. Wang, and E.J. Mittemeijer: Thermodynamics of reactions and phase transformations at interfaces and surfaces. Int. J. Mater. Res. 100, 1281 (2009).

    Article  CAS  Google Scholar 

  34. J.C. Slater: Atomic radii in crystals. J. Chem. Phys. 41, 3199 (1964).

    Article  CAS  Google Scholar 

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ACKNOWLEDGMENTS

The authors are grateful to Mr. Reinhart Völker for preparation of specimens by magnetron sputtering, to Dipl.-Ing. Bernhard Siegle and Dipl.-Ing. Martin Noah for AES measurements, and to Dipl.-Ing. Gerd Maier for support with in situ XRD measurements.

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Correspondence to Zumin Wang.

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Niedermeier, C.A., Wang, Z. & Mittemeijer, E.J. Impact of interface thermodynamics on Al-induced crystallization of amorphous SixGe1–x alloys. Journal of Materials Research 29, 786–792 (2014). https://doi.org/10.1557/jmr.2014.49

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