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Effects of deposition temperature on the microstructure of MOCVD Y1Ba2Cu3O7−x thin films

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Abstract

The effects of deposition temperature on the microstucture and composition of Y1Ba2Cu3O7−x films deposited on MgO and SrTiO3 substrates by the metal-organic chemical vapour deposition (MOCVD) method were investigated. As the deposition temperature decreased from 900 to 700 °C, the Cu content in the deposited film increased. SEM micrographs of the films showed that the growth direction of the film was changed from c axis to a axis perpendicular to the substrate surface, and then to random orientation, as the deposition temperature decreased. The superconducting transition temperature and the transition width of films deposited on SrTiO3 substrates at temperatures higher than 810 °C were over 90 K and within 1 K, respectively.

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References

  1. M. K. Wu, J. R. Ashburn, C. J. Trong, P. H. Hor, R. L. Meng, L. Gao, Z. J. Huang, Y. Q. Wang and C. W. Chu, Phys. Rev. Lett. 58 (1987) 908.

    Article  CAS  Google Scholar 

  2. H. Maeda, Y. Tanaka, M. Hukutomi and T. Asano, Jpn J. Appl. Phys. 27 (1988) L209.

    Article  CAS  Google Scholar 

  3. Z. Z. Sheng and A. M. Hermann, Nature 332 (1988) 55.

    Article  CAS  Google Scholar 

  4. P. K. Gallagher, H. M. O'Bryan, S. A. Sunshine and D. W. Murphy, Mater. Res. Bull. 22 (1987) 995.

    Article  CAS  Google Scholar 

  5. S. Miura, T. Yoshitake, T. Satoh, Y. Miyaska and N. Shohat, Appl. Phys. Lett. 52 (1988) 1008.

    Article  CAS  Google Scholar 

  6. K. Terashima, K. Eguchi, T. Yoshica and K. Akashi, ibid. 52 (1988) 1274.

    Article  CAS  Google Scholar 

  7. J. W. C. de Vries, B. Pam, M. G. J. Heijam, G. M. Stollman and M. A. M. Gijs, ibid. 52 (1988) 1904.

    Article  Google Scholar 

  8. F. Schmaderer and G. Wahl, J. Physique 50 (1989) 119.

    Google Scholar 

  9. H. Abe, T. Tsuruoka and T. Nakamori, Jpn J. Appl. Phys. 27 (1988) L1473.

    Article  CAS  Google Scholar 

  10. A. J. Panson, R. G. Charles, D. N. Schmidt, J. R. Szedon, G. J. Machiko and A. I. Braginski, Appl. Phys. Lett. 53 (1988) 1756.

    Article  CAS  Google Scholar 

  11. M. R. Rao, E. J. Tarsa, L. A. Samoska, J. M. English, A. C. Gossard, H. Kroemer, P. M. Petroff and E. L. Hu, ibid. 56 (1990) 1905.

    Article  CAS  Google Scholar 

  12. S. Matsuno, F. Uchikawa and K. Yoshizaki, Jpn J. Appl. Phys. 29 (1990) L947.

    Article  CAS  Google Scholar 

  13. Wong-Ng and W. Roth, Adv. Ceram. Mater. 2(3B) (1987) 565.

    Article  CAS  Google Scholar 

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Cho, C., Hwang, D., No, K. et al. Effects of deposition temperature on the microstructure of MOCVD Y1Ba2Cu3O7−x thin films. JOURNAL OF MATERIALS SCIENCE 28, 2915–2922 (1993). https://doi.org/10.1007/BF00354694

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  • DOI: https://doi.org/10.1007/BF00354694

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