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The effect of additives on the electrodeposition of copper studied by the impedance technique

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Abstract

The impedance technique has been used to study the effects of NaCl, glue, thiourea and ‘Avitone’ on the elctrodeposition of copper in a 0.71M CuSO4-1.80M H2SO4 solution. NaCl affects the rate of the two-step reaction and glue is a polarizer due to adsorption on the surface. The degradation of glue by hydrolysis can be followed using impedance measurements. No significant effects of thiourea and Avitone could be detected in the concentration and potential range used in electrorefining.

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References

  1. H. S. Jennings and F. E. Rizzo,Metall. Trans. 4 (1973) 921.

    Google Scholar 

  2. T. J. O'Keefe and L. R. Hurst,J. Appl Electrochem. 8 (1978) 109.

    Google Scholar 

  3. Y. -L. Yao,Trans. Electrochem. Soc. 86 (1944) 371.

    Google Scholar 

  4. W. H. Gauvin and C. A. Winkler,J. Electrochem. Soc. 99 (1952) 71.

    Google Scholar 

  5. S. G. Byallozor,Sov. Electrochem. 4 (1968) 521.

    Google Scholar 

  6. V. I. Lakshamanan, D. J. Mackinnon and J. M. Brannen,J. Appl. Electrochem. 7 (1977) 81.

    Google Scholar 

  7. D. R. Turner and G. R. Johnson,J. Electrochem. Soc. 109 (1962) 798.

    Google Scholar 

  8. D. R. Gabe and D. J. Robinson,Trans. Inst. Met. Finish. 49 (1971) 17.

    Google Scholar 

  9. G. Lahousse and L. Heerman,Bull. Soc. Chim. Belg. 80 (1971) 125.

    Google Scholar 

  10. F. Lenoir and R. Wiart,Met. Corros. Ind. 47 (1972) 1.

    Google Scholar 

  11. Idem, ibid. 47 (1972) 59.

    Google Scholar 

  12. I. R. Burrows, J. A. Harrison and J. Thompson,J. Electroanal. Chem. 58 (1975) 241.

    Google Scholar 

  13. J. A. Harrison, D. R. Sandbach and P. J. Stronach,Electrochim. Acta 24 (1979) 179.

    Google Scholar 

  14. S. H. Glarum and J. H. Marshall,J. Electrochem. Soc. 128 (1981) 968.

    Google Scholar 

  15. T. N. Anderson, R. D. Budd and R. W. Strachan,Metall. Trans. B 7B (1976) 333.

    Google Scholar 

  16. N. R. Bharucha, Z. Zavorsky and R. L. Leroy,ibid. 9B (1978) 509.

    Google Scholar 

  17. M. Fleischmann, I. R. Hill and G. Sundholm,J. Electroanal. Chem. 157 (1983) 359.

    Google Scholar 

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Fabricius, G., Sundholm, G. The effect of additives on the electrodeposition of copper studied by the impedance technique. J Appl Electrochem 14, 797–801 (1984). https://doi.org/10.1007/BF00615270

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