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Fabrication of TiN-based three-terminal nano mechanical relays using nanoimprint technology

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Abstract

This paper reports the fabrication of nanoscale mechanical relays using a nanoimprint technology, called contact-transfer and mask-embedded lithography. This cost effective method facilitates the fabrication of nanoscale metallic source electrodes in one easy step. For the design and simulation of relays, we developed a purpose-built system to measure the resonant frequency of TiN nano-structures to determine the mechanical properties of nanoscale thin films. The results presented a Young’s modulus of approximately 600 GPa and residual stress low enough to be disregarded in the proposed process. Finally, we succeeded in fabricating three-terminal nano-relays of various lengths, the operation of which was demonstrated by measuring the I–V curve of each device. Measured pull-in voltages were compared with those of the simulation results.

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Acknowledgments

The authors would like to thank the National Science Council (NSC98-2218-E-224-009-) for their financial support and the National Nano-Device Laboratory for supplying equipment, as well as the Center for Micro/Nano Science and Technology at National Cheng Kung University, Taiwan.

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Correspondence to Y. J. Chang.

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Chang, Y.J., Liu, D.Y. & Kuo, C.L. Fabrication of TiN-based three-terminal nano mechanical relays using nanoimprint technology. Microsyst Technol 19, 537–545 (2013). https://doi.org/10.1007/s00542-012-1650-6

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  • DOI: https://doi.org/10.1007/s00542-012-1650-6

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