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Influence of Substrate Temperature on the Properties of Cobalt Oxide Thin Films Prepared by Nebulizer Spray Pyrolysis (NSP) Technique

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Abstract

Cobalt oxide thin films are prepared by the nebulizer spray pyrolysis technique using cobalt chloride as the precursor material. The structural, optical, morphological and electrical properties are investigated as a function of substrate temperature (300–450 °C). The X-ray diffraction (XRD) analysis reveals that all the films are polycrystalline in nature, having cubic structure with preferential orientation along the (111) plane. The optical spectra show that the films are transparent (68 %) in the IR region. The optical band gap values are calculated for different substrate temperature. Photoluminescence (PL) spectra of the films indicate the presence of indigo, blue and green emission peaks with an ultraviolet emission peak centered around 368nm. SEM images reveals small sphere-like structures for the prepared Co3O4 films. The maximum conductivity obtained is 1.48 x 10−3 S/cm at 350 °C. The activation energy varies between 0.039 and 0.138 eV for the substrate temperature variation from 300-450 Q°C.

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References

  1. Kandalkar SG, Dhawale DS, Kim C-K, Lokhande CD (2010) Synth Met 160:1299–1302

    Article  CAS  Google Scholar 

  2. YalanWanga H, Wang X (2013) Electrochimic Acta 92:298–303

    Article  Google Scholar 

  3. Kandalkar SG, Gunjakar JL, Lokhande CD (2008) Appl Surf Sci 254:5540–5544

    Article  CAS  Google Scholar 

  4. Shinde VR, Mahadik SB, Gujar TP, Lokhande CD (2006) Appl Surf Sci 252:7487–7492

    Article  CAS  Google Scholar 

  5. Wollenstein J, Burgmair M, Plescher G, Sulima T, Hildenbrand J, Böttner H, Eisele I (2003) Sensors Actuators B 93:442–448

    Article  CAS  Google Scholar 

  6. Avila GA, Barrera CE, Huerta AL, Muhl S (2004) Sol Energy Mater Sol Cells 82:269–278

    Article  Google Scholar 

  7. Guyon C, Barkallah A, Rousseau F, Giffard K, Morvan D, Tatoulian M (2011) Surf Coat Technol 206:1673–1679

    Article  CAS  Google Scholar 

  8. Do J-S, Weng C-H (2005) J Power Sources 146:482–486

    Article  CAS  Google Scholar 

  9. Louardi A, Rmili A, Ouachtari F, Bouaoud A, Elidrissi B, Erguig H (2011) J Alloys Compd 509:9183–9189

    Article  CAS  Google Scholar 

  10. Klepper KB, Nilsen O, Fjellvag H (2007) Thin Solid Films 515:7772–7781

    Article  CAS  Google Scholar 

  11. Tototzintle-Huitle H, Prokhorov E, Mendoza-Galvan A, Urbina JE, GonzalezHernandez J (2003) J PhysChem Solids 64:975–980

    Article  CAS  Google Scholar 

  12. Cheng C-S, Serizawa M, Sakata H, Hirayama T (1998) Mater Chem Phys 53:225–230

    Article  CAS  Google Scholar 

  13. Dupin JC, Gonbeau D, Benqlilou-Moudden H, Vinatier Ph, Levasseur A (2001) Thin Solid Films 384:23–32

    Article  CAS  Google Scholar 

  14. Kung C-W, Lin C-Y, Li T-J, Vittal R, Ho K-C (2011) Procedia Engineering 25:847–850

    Article  CAS  Google Scholar 

  15. Shelke PN, Khollam YB, Hawaldar RR, Gunjal SD, Udawant RR, Sarode MT, Takwaleb MG, Mohite KC (2013) Fuel 112:542–549

    Article  CAS  Google Scholar 

  16. Mariappan R, Ponnuswamy V, Suresh P, Suresh R, Ragavendar M, Sankar C (2013) Mater Sci Semicond Process 16:825–832

    Article  CAS  Google Scholar 

  17. Suresh R, Ponnuswamy V, Mariappan R, Senthil Kumar N (2014) Ceram Int 40:437–445

    Article  CAS  Google Scholar 

  18. Mariappan R, Ponnuswamy V, Ragavendar M (2013) Met Mater Int 19:1–8

    Article  Google Scholar 

  19. Sethupathi N, Thirunavukkarasu P, Vidhya VS, Thangamuthu R, Kiruthika GVM, Perumal K, Bajaj Hari C, Jayachandran M (2012) J Mater Sci: Mater Electron 23:1087–1093

    CAS  Google Scholar 

  20. Scherrer P (1918) Göttinger Nachrichten Gesell 2:98

    Google Scholar 

  21. Mariappan R, Ponnuswamy V, Chandra Bose A, Chithambararaj A, Suresh R, Ragavendar M (2014) Superlattice Microst 65:184–194

    Article  CAS  Google Scholar 

  22. Kadam LD, Patil PS (2001) Mater Chem Phys 68:225–232

    Article  CAS  Google Scholar 

  23. Pal J, Chauhan P (2010) Mater Charact 61:575–579

    Article  CAS  Google Scholar 

  24. Cao B, Sunand F, Cai W, Electrochem S (2005) Solid-State Lett 8:G237–G240

    Article  CAS  Google Scholar 

  25. Li Y, Meng GW, Zhang LD (2000) Appl Phys Lett 76:15–20 doi:10.1063/1.126238

  26. Patil PS, Kadam LD, Lokhande CD (1996) Thin Solid Films 272:29–32

    Article  CAS  Google Scholar 

Download references

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Authors and Affiliations

  1. Sri Ramakrishna Mission Vidyalaya College of Arts and Science, Coimbatore, 641 020, Tamilnadu, India

    M. Manickam, V. Ponnuswamy, C. Sankar & R. Suresh

  2. Adhiyamaan College of Engineering, Hosur, 635 109, Tamilnadu, India

    R. Mariappan

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  1. M. Manickam
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  2. V. Ponnuswamy
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  3. C. Sankar
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  4. R. Mariappan
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  5. R. Suresh
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Correspondence to V. Ponnuswamy.

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Manickam, M., Ponnuswamy, V., Sankar, C. et al. Influence of Substrate Temperature on the Properties of Cobalt Oxide Thin Films Prepared by Nebulizer Spray Pyrolysis (NSP) Technique. Silicon 8, 351–360 (2016). https://doi.org/10.1007/s12633-015-9316-5

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  • DOI: https://doi.org/10.1007/s12633-015-9316-5

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