Abstract
A mathematical model is derived to elucidate the dominant mechanism governing film formation. It leads to a relation between film thickness and film radius spreading with time. Inclusion of evaporation and shear stress was made with extension to non-Newtonian fluid. The advantages and disadvantages of this process with applications are reviewed.
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Sahu, N., Parija, B. & Panigrahi, S. Fundamental understanding and modeling of spin coating process: A review. Indian J Phys 83, 493–502 (2009). https://doi.org/10.1007/s12648-009-0009-z
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DOI: https://doi.org/10.1007/s12648-009-0009-z