Abstract
In this work, we synthesized the Mn-doped (K0.5Na0.5)NbO3 (KNMN) thin films via RF-magnetron sputtering. The effect of the post-annealing temperature on the KNMN film was studied in terms of its structural, ferroelectric, and leakage current properties. We achieved a single perovskite phase in KNMN film. The crystalline quality of the KNMN film was improved further via post-annealing the thin film in the rapid temperature process (RTP), the increase in the intensity of the (100) peak as well as the identification of the additional (200) diffraction peak. The increase in the ferroelectric performance and the reduction in the leakage current density of the post-annealed KNMN film were attributed to the improved crystallinity of the KNMN film. Based on the X-ray photoelectron spectroscopy results, we noticed that the effect of both the chemisorbed layer and the oxygen vacancies was weakened further, thus increasing the crystalline quality of the KNMN film due to post-annealing.
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Acknowledgements
This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (2020R1I1A3068422). This work was supported by Priority Research Centers Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (NRF-2019R1A6A1A11053838).
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Sheeraz, M., Nguyen, B.T., Han, HS. et al. Influence of post-annealing on Mn-doped (K0.5Na0.5)NbO3 thin films. J. Korean Phys. Soc. 80, 628–633 (2022). https://doi.org/10.1007/s40042-022-00450-w
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DOI: https://doi.org/10.1007/s40042-022-00450-w