Abstract
A considerable body of research literature on deep centers in GaAs is analyzed. It is shown that the issue remains most relevant to GaAs microelectronics. Data are discussed on the nature of deep centers in the bulk-grown and epitaxial forms of GaAs, whether ion-implanted or undoped. Methods for the characterization of deep centers are described. Theoretical models representing the influence of deep centers on the parameters of devices and ICs are considered. Particular coverage is given to backgating. Practical recommendations are reviewed for controlling the adverse effects of deep centers on the performance of GaAs devices and ICs.
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Khuchua, N.P., Khvedelidze, L.V., Tigishvili, M.G. et al. Deep-Level Effects in GaAs Microelectronics: A Review. Russian Microelectronics 32, 257–274 (2003). https://doi.org/10.1023/A:1025528416032
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DOI: https://doi.org/10.1023/A:1025528416032