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Ranges of Hydrogen, Deuterium, and Helium Atoms in Amorphous Silicon and Tungsten

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Abstract

We have obtained the range distributions for H, D, and He atoms within an energy range of 0.1–100 keV in amorphous W and Si for the normal incidence of bombarding particles. Calculations have been performed both in the binary collision approximation and by a more accurate method of calculating particle trajectories. It is shown that the results of both methods are in good agreement with each other and with experimental data on the mean ranges for the H–Si system. The influence of the attracting well in the particle–solid interaction potential on the results of calculations is estimated.

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REFERENCES

  1. V. M. Kivilis, E. S. Parilis, and N. Yu. Turaev, Dokl. Akad. Nauk 173, 805 (1967).

    Google Scholar 

  2. V. E. Yurasova, V. I. Shulga, and D. S. Karpuzov, Can. J. Phys. 46, 759 (1968). https://doi.org/10.1139/p68-094

    Article  ADS  Google Scholar 

  3. E. S. Mashkova and V. A. Molchanov, The Use of Ion Scattering in Solids Analysis (Energoatomizdat, Moscow, 1995).

    Google Scholar 

  4. W. Eckstein, Computer Simulation of Ion–Solid Interactions (Springer, 1991).

    Book  Google Scholar 

  5. http://www.srim.org.

  6. M. T. Robinson and I. M. Torrens, Phys. Rev. B 9, 5008 (1974). https://doi.org/10.1103/PhysRevB.9.5008

    Article  ADS  Google Scholar 

  7. P. Y. Babenko, A. N. Zinoviev, D. S. Meluzova, and A. P. Shergin, J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 12, 520 (2018). https://doi.org/10.1134/S1027451018030230

    Article  Google Scholar 

  8. P. Yu. Babenko, A. M. Deviatkov, D. S. Meluzova, A. P. Shergin, A. N. Zinoviev, Nucl. Instrum. Methods Phys. Res., Sect. B 406, 538 (2017). https://doi.org/10.1016/j.nimb.2016.12.043

    Article  Google Scholar 

  9. https://www-nds.iaea.org/stopping.

  10. L. Verlet, Phys. Rev. 159, 98 (1967). https://doi.org/10.1103/PhysRev.159.98

    Article  ADS  Google Scholar 

  11. E. Ligeon and A. Guivarc’h, Radiat. Eff. 27, 129 (1976). https://doi.org/10.1080/00337577608243025

    Article  Google Scholar 

  12. M. Weiser, M. Behar, S. Kalbitzer, P. Oberschachtsiek, D. Fink, and G. Frech, Nucl. Instrum. Methods Phys. Res., Sect. B 29, 587 (1987). https://doi.org/10.1016/0168-583X(87)90073-5

    Article  Google Scholar 

  13. A. N. Zinoviev, Nucl. Instrum. Methods Phys. Res., Sect. B 269, 829 (2011). https://doi.org/10.1016/j.nimb.2010.11.074

    Article  Google Scholar 

  14. B. P. Nikol’skii, Chemistry Handbook (Khimiya, Moscow, 1966), Vol. 1.

    Google Scholar 

  15. A. N. Zinoviev and K. Norlund, Nucl. Instrum. Methods Phys. Res., Sect. B 406, 511 (2017). https://doi.org/10.1016/j.nimb.2017.03.047

    Article  Google Scholar 

  16. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).

    Google Scholar 

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Funding

This study was performed under a State assignment of the Ministry of Education and Science of the Russian Federation for the Federal State Budget Scientific Enterprise Ioffe Institute, Russian Academy of Sciences.

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Correspondence to D. S. Meluzova.

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Translated by N. Wadhwa

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Meluzova, D.S., Babenko, P.Y., Shergin, A.P. et al. Ranges of Hydrogen, Deuterium, and Helium Atoms in Amorphous Silicon and Tungsten. Tech. Phys. 65, 145–150 (2020). https://doi.org/10.1134/S106378422001017X

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  • DOI: https://doi.org/10.1134/S106378422001017X

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