Abstract
Structure factors of μ-TiAl equiaxed grain in TiAl duplex intermetallic compound before and after V-alloying were measured by the quantitative electron crystallography method. Then the structure factors were transferred into charge-density distributions of real space. Comparing the charge-density distributions in γ-TiAl with those in V-alloyed γ-TiAl, it was found that V-alloying with the optimum amount decreases the electronic charge density in the Ti-Ti interatomic bond, and increases the electronic charge density in the Al-Al interatomic bond and Ti-Al interatomic bond. Thus, the anisotropy of charge-density distribution in γ-TiAl equiaxed grain is reduced.
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Miao, Y., Zhu, J., Lin, X.W. et al. The study on charge-density distribution in TiAl by quantitative electron crystallography method. Journal of Materials Research 10, 1913–1916 (1995). https://doi.org/10.1557/JMR.1995.1913
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DOI: https://doi.org/10.1557/JMR.1995.1913