Abstract
Clean liquids are required in all cleanroom operations, whether the clean liquids are the product or are used in the fabrication of other cleanroom products. Processing and final cleaning of liquids to be used for semiconductor devices is frequently carried out in cleanrooms to provide clean process material for a later operation. Many pharmaceutical products are liquids used for injection or ingestion. Plastic films to be used for photography or for packaging elements are polymerized from organic liquids, which must be free of contaminating particles. These and other similar products must be free of both dissolved and suspended contaminants. Very clean reagent-grade water is required for container cleaning before products are placed in the containers. In the semiconductor industry, many manufacturing processes result in deposition of contaminants that must be removed from components by flushing with clean liquids. In addition, semiconductor manufacturing often requires the use of process chemicals that may be received with a high contamination level. Most aerospace device surfaces must be cleaned before use. This requirement applies both to operating devices and especially to the interior of fuel and oxidizer storage and flow systems. Liquids of all types are used in these areas. They may be inorganic or organic, with high or low vapor pressures, inert or reactive, and single component or mixtures.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Blazka, S., & Hegde, R., 1989. Effect of Microfiltration on Photoresist Quality and Integrity. Microelectronic Manufacturing and Testing 12(7):33–35.
Carmody, J. C, & Martyak, J. E., 1989. Controlling Bacterial Growth in an Ultrapure Deionized Water System. Microcontamination 7( 1):28–35.
Cleavelin, C. R., & Jones, A. H., 1988. The Manufacturing Impact of Continuous Point-of-Use Chemical Reprocessing. Solid State Technology 31( 12):53–56.
Craven, R. A., Ackerman, A. J., & Tremont, P. L., 1986. High Purity Water Technology for Silicon Wafer Cleaning in VLSI Production. Proceedings of the 4th Millipore SEMI Symposium, May 19, 1986, San Mateo, CA.
Crinigan, P. T., 1989. Liquid Filtration in Nuclear Power Plants. Ultrapure Water 6(l):52–54.
Gallagher, D. J., 1989. High-Purity Semiconductor Process Chemicals. Microelectronic Manufacturing and Testing 12(4):21–22.
Gooding, C. H., 1986. Reverse Osmosis and Ultrafiltration Solve Separation Problems. Chemical Engineering 92(l):56–62.
Grant, D. C, et al., 1989. Particle Capture Mechanisms in Gases and Liquids: An Analysis of Operative Mechanisms in Membrane/Fibrous Filters. Journal of Environmental Science 32(4):43–51.
Hango, R. A., & Pettengill, N. E., 1987. A Cost Effective Approach to DI Distribution System Upgrade. Proceedings of the 6th Pure Water Conference, January 15, 1987, Santa Clara, CA.
James, J. B., et al., 1988. Bacterial and Endotoxin Retention by Charge-Modified Filters. Semiconductor International 11(4):80–82.
Jones, A. H., & Hoffman, J. G., 1988. Point-of-Use Acid Reprocessing for Semiconductor Applications. Proceedings of the 35th Institute of Environmental Science Annual Technical Meeting, pp. 474–477, May 19, 1988, King of Prussia, PA.
Jones, D., 1986. Submicron Particle Levels in Process Chemicals. Proceedings of the 4th Millipore SEMI Symposium, May 19, 1986, San Mateo, CA.
Kikuyama, H., et al., 1989. Cleanness Technology of Hydrofluoric Acid. Proceedings of the 35th Institute of Environmental Sciences Annual Technical Meeting, pp. 369–376, May 1989, Anaheim, CA.
Lawton, D. J., 1987. What Makes Cartridge Filters Perform Effectively. Chemical Engineering Progress 83(11 ):20–25.
Milner, T. A., & Brown, T. M., 1986. A Model for Predicting the Effect of a Processing Bath on Wafer Particle Contamination. Proceedings of the Micro-contamination Conference, November 1986, Santa Clara, CA.
Nebel, C., 1988. Ozone, the Process Water Sterilant. Ultrapure Water 5(8):40–49.
Pengra, D., Hogsett, L., & McCall, D., 1990. Correcting Bacterial Contamination of DI Water in GaAs Wafer Prep Sinks. Proceedings of the 36th Institute of Environmental Science Annual Technical Meeting, pp. 217–220, April 23, 1990, New Orleans.
Peyton, G. R., & Glaze, W. R., 1988. Destruction of Pollutants in Water with Ozone in Combination with Ultraviolet Radiation: 3. Photolysis of Aqueous Ozone. Environmental Science and Technology 22(7):761–767.
Pittner, G. A., & Bertier, G. 1988. Point-of-Use Contamination Control of Pure Water through Continuous Ozonation. Ultrapure Water 5(4): 16–22.
Rechen, H. C 1985. Microorganism and Particulate Control in Microelectronics Process Water Systems: Pharmaceutical Manufacturing Technology. Micro-contamination 3(7):22–29.
Shadman, F., Governal, R., & Bonner, A., 1990. Interactions between UV and Membrane Filters during Removal of Bacteria and TOC from DI Water. Proceedings of the 36th Institute of Environmental Sciences Annual Technical Meeting, pp. 221–228, April 23, 1990, New Orleans, LA.
Siegmann, R. P., 1987. Point-of-Use Contamination Control of Ultrapure De-ionized Water for Semiconductor Processing. Microcontamination 5(5):22–26.
Stewart, D. A., et al., 1987. Contamination Control in Chemicals and Water. Proceedings of the 6th Pure Water Conference, January 15, 1987. Santa Clara,CA.
Werner, R., 1983. Anti-Microbial Processing of Deionized Water in the Context of Clean Area Technology. Swiss Pharma 5(1la):27–31.
Zoccolante, G., 1987. Innovations in Water Purification. Semiconductor International 10(2):86–89.
Rights and permissions
Copyright information
© 1992 Van Nostrand Reinhold
About this chapter
Cite this chapter
Lieberman, A. (1992). Liquid Cleaning Methods. In: Contamination Control and Cleanrooms. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-6512-9_9
Download citation
DOI: https://doi.org/10.1007/978-1-4684-6512-9_9
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4684-6514-3
Online ISBN: 978-1-4684-6512-9
eBook Packages: Springer Book Archive