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A Comparative Study of Metal Oxide Modified, Silicon Wafer and Silicon Nanowires on Silicon Chip as Gas/Vapor Sensing Element

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The Physics of Semiconductor Devices (IWPSD 2017)

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Abstract

The synthesis and room temperature chemical gas sensing behavior of the as-grown n-Tin Oxide (SnO2) on p-type polycrystalline Silicon (pc-Si) and silicon nanowires (SiNWs) on Silicon substrate are reported in this paper. The Metal assisted Chemical Etching of pc-Si has resulted into vertically aligned, uniform grown highly dense SiNWs. These NWs on pc-Si substrate are decorated by SnO2 particles by the Electro-deposition technique. The surface morphology of fabricated device by SEM depicts SnO2 particles deposition on top of SiNWs. The sensing responses of pristine and tin oxide decorated Si substrate are compared with the sensing behavior of in situ and tin oxide modified SiNWs under the ammonia, acetone and ethanol environment. These results suggest that the proposed tin oxide decorated SiNWs shows analyte selectivity with appreciable rise in responsivity (more than 50%) due to nanostructure of SiNWs template.

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Acknowledgements

The authors are thankful to Dr. Ashok K. Chauhan, Founder President, Amity University, Noida for his continuous guidance and encouragement. The authors would also like to thank Dr. D. N. Singh from IndoSolar Pvt. Ltd., India for providing the silicon wafer to carry out the experiments.

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Correspondence to Amit Kumar .

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Yuvaraja, S. et al. (2019). A Comparative Study of Metal Oxide Modified, Silicon Wafer and Silicon Nanowires on Silicon Chip as Gas/Vapor Sensing Element. In: Sharma, R., Rawal, D. (eds) The Physics of Semiconductor Devices. IWPSD 2017. Springer Proceedings in Physics, vol 215. Springer, Cham. https://doi.org/10.1007/978-3-319-97604-4_142

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