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New Models of Sputtering and Ion Knock-On Mixing

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Secondary Ion Mass Spectrometry SIMS II

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 9))

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Abstract

We have recently developed new models of sputtering [1], ion emission [2], and ion knock-on mixing [3] which provide quick and accurate estimates of neutral and ion sputtering yields and of the broadening observed in a sputter-profiling experiment. In this abstract, we briefly summarize the major features of the sputtering and ion emission models.

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References

  1. S.A. Schwarz, C.R. Helms, J. Appl. Phys., Aug. 1979, in press.

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  2. S.A. Schwarz, C.R. Helms, to be published.

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  3. S.A. Schwarz, C.R. Helms, J. Yac. Sci. Techno!., l6, 781 (1979).

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© 1979 Springer-Verlag New York

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Schwarz, S.A., Helms, C. (1979). New Models of Sputtering and Ion Knock-On Mixing. In: Benninghoven, A., Evans, C.A., Powell, R.A., Shimizu, R., Storms, H.A. (eds) Secondary Ion Mass Spectrometry SIMS II. Springer Series in Chemical Physics, vol 9. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-61871-0_4

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  • DOI: https://doi.org/10.1007/978-3-642-61871-0_4

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-61873-4

  • Online ISBN: 978-3-642-61871-0

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