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Application of Computer-Controlled SIMS to Depth Profiling of Impurities Implanted in Silicon with High Dose of B+or BF2 + Ions

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Secondary Ion Mass Spectrometry SIMS IV

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 36))

Abstract

Recently, TANIGAKI and co-workers have developed an electronic data processing system for an ion microprobe mass analyzer (ARL-IMMA) interfaced with a personal computer, that is to say an “automatic depth profiler” [1]. In this system, conversion of secondary ion intensity to atomic concentration and of sputtering time to depth scale can be easily carried out by setting two main parameters, viz. the measured conversion coefficient and the sputtering rate.

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References

  1. T. Tanigaki and T. Harada : Japan Society for the Promotion of Science, 141st Committee-Microbeam Analysis, The 10th Local Meeting, July (1982) 45.

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  2. K. Nishiyama, M. Arai and N. Watanabe : Jpn. J. Appl. Phys. 19, L563 (1980).

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  3. H. Ryssel, K. Müller, K. Haberger, R. Henkelmann and F. Jahnel : Appl. Phys. 22, 35 (1980).

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  4. W. K. Hofker, H. W. Werner, D. P. Oosthoek and H. A. M. de Grefte : Appl. Phys. .2, 265 (1973).

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Author information

Authors and Affiliations

  1. Sony Corporation, Yokohama 240, Japan

    T. Tanigaki & S. Kawado

  2. Research Center and Semiconductor Division, Atsugi 243, Japan

    K. Nishiyama

Authors
  1. T. Tanigaki
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  2. S. Kawado
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  3. K. Nishiyama
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Editor information

Editors and Affiliations

  1. Phsysikalisches Inst., Universität Münster, Münster, D-4400, Fed. Rep. of Germany

    A. Benninghoven

  2. College of General Education, Osaka University, Osaka 560, Japan

    J. Okano

  3. Department of Applied Physics, Osaka University, Osaka 565, Japan

    R. Shimizu

  4. Philips Research Laboratories, Eindhoven, The Netherlands

    H. W. Werner

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© 1984 Springer-Verlag Berlin Heidelberg

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Tanigaki, T., Kawado, S., Nishiyama, K. (1984). Application of Computer-Controlled SIMS to Depth Profiling of Impurities Implanted in Silicon with High Dose of B+or BF2 + Ions. In: Benninghoven, A., Okano, J., Shimizu, R., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS IV. Springer Series in Chemical Physics, vol 36. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82256-8_81

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  • DOI: https://doi.org/10.1007/978-3-642-82256-8_81

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82258-2

  • Online ISBN: 978-3-642-82256-8

  • eBook Packages: Springer Book Archive

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