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Part of the book series: NATO ASI Series ((NSSE,volume 160))

Abstract

SiGe/Si superlattices are a promising material for a silicon based integration of conventional integrated circuits with heterojunction devices. Si and Ge are lattice mismatched by 4.2%. This paper describes conditions for stable superlattice growth and explains methods for strain adjustment in the superlattice. Devices are described and essential results given. Ultrathin superlattices and their potential for observation of zone folding effects are mentioned.

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© 1989 Kluwer Academic Publishers

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Kasper, E. (1989). SiGe/Si Superlattices: Strain Influence and Devices. In: Nissim, Y.I., Rosencher, E. (eds) Heterostructures on Silicon: One Step Further with Silicon. NATO ASI Series, vol 160. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-0913-7_13

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  • DOI: https://doi.org/10.1007/978-94-009-0913-7_13

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-6900-7

  • Online ISBN: 978-94-009-0913-7

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