Synonyms
Feature size dependent etching
Definition
RIE lag is the phenomenon of the etching rate related to the feature size. The larger the feature size, the higher the etching rate. As the larger feature size results in the lower etching rate, it is called inverse RIE lag.
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© 2008 Springer-Verlag
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(2008). RIE Lag. In: Li, D. (eds) Encyclopedia of Microfluidics and Nanofluidics. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-48998-8_1363
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DOI: https://doi.org/10.1007/978-0-387-48998-8_1363
Publisher Name: Springer, Boston, MA
Print ISBN: 978-0-387-32468-5
Online ISBN: 978-0-387-48998-8
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