Skip to main content

Ellipsometry

  • Living reference work entry
  • First Online:
Handbook of Advanced Non-Destructive Evaluation
  • 541 Accesses

Abstract

Over the past few decades, ellipsometry has become an important and widely used optical metrology tool in scientific research and industrial manufacturing due to its nondestructive nature and inherent simplicity. There have been increasing needs to extend the capabilities of ellipsometry to spatially resolve materials and structures with micro- and nanoscale features. In this chapter, the basic principle of ellipsometry will be reviewed, and two microellipsometry techniques that employ high numerical aperture (NA) objective lens capable of characterizing structures and materials with high spatial resolution are presented. The use of high NA lens collects more oblique rays to increase the ellipsometric signal while providing high spatial resolution of these techniques for spatially resolved characterization tasks. The working principles and experimental setups in each case are discussed mathematically and demonstrated schematically, respectively. Applications of these techniques to characterize patterned surface structures, unresolved surface features, residual axial birefringence, and micro-optical components are subsequently summarized. Finally, taking advantage of the recent rapid developments in vector optical fields, rapid polarimetric measurement techniques utilizing parallel polarization measurement that can extract the entire polarization information from the sample with a single intensity snapshot will be described.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Institutional subscriptions

References

  • Albersdörfer A, Elender G, Mathe G, Neumaier K R, Paduschek P, Sackmann E (1998) High resolution imaging microellipsometry of soft surfaces at 3 μm and 5 Ã… normal resolution. Appl Phys Lett 72:2930–2932

    Google Scholar 

  • Azzam RMA, Bashara NM (eds) (1977) Ellipsometry and polarized light. North Holland Publishing Company, New York

    Google Scholar 

  • Erman M, Theeten JB (1986) Spatially resolved ellipsometry. J Appl Phys 60:859–873

    Article  Google Scholar 

  • Gold N, Willenborg DL, Opsal J, Rosencwaig A (1989) High resolution ellipsometric apparatus. US Patent #5042951

    Google Scholar 

  • Herman IP (ed) (1996) Optical diagnostics for thin film processing. Academic, San Diego

    Google Scholar 

  • Jin G, Jansson R, Arwin H (1996) Imaging ellipsometry revisited: development for visualization of thin transparent layers on silicon substrates. Rev Sci Instrum 67:2930–2935

    Article  Google Scholar 

  • Leng JM, Chen J, Fanton J, Senko M, Ritz K, Opsal J (1998) Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectometry, beam profile ellipsometry and spectroscopic beam profile ellipsometry. Thin Solid Films 313:308–313

    Article  Google Scholar 

  • Liu A, Wayner PC, Plawsky JL (1994) Image scanning ellipsometry for measuring nonuniform film thickness profiles. Appl Opt 33:1223–1229

    Article  Google Scholar 

  • Minhas BK, Coulombe SA, Naqvi SSH, McNeil JR (1998) Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures. Appl Opt 37:5112–5115

    Google Scholar 

  • Moharam MG, Grann EB, Pommet DA, Gaylord TK (1995a) Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings. J Opt Soc Am A 12:1068–1076

    Article  Google Scholar 

  • Moharam MG, Grann EB, Pommet DA, Gaylord TK (1995b) Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach. J Opt Soc Am A 12:1077–1086

    Article  Google Scholar 

  • Otaki K, Osawa H, Ooki H, Saito J (2000) Polarization effect on signal from optical ROM using solid immersion lens. Jpn J Appl Phys 39:698–706

    Article  Google Scholar 

  • Quabis S, Dorn R, Eberler M, Glöckl O, Leuchs G (2000) Focusing light into a tighter spot. Opt Commun 179:1–7

    Article  Google Scholar 

  • Richards B, Wolf E (1959) Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system. Proc R Soc Ser A 253:358–379

    Article  Google Scholar 

  • See CW, Somekh MG, Holmes RD (1996) Scanning optical microellipsometer for pure surface profiling. Appl Opt 35:6663–6668

    Article  Google Scholar 

  • Shribak M, Inoué S, Oldenbourg R (2002) Polarization aberrations caused by differential transmission and phase shift inn high-numerical-aperture lenses: theory, measurement, and rectification. Opt Eng 41:943–954

    Article  Google Scholar 

  • Stallinga S (2001) Axial birefringence in high-numerical-aperture optical systems and the light distribution close to focus. J Opt Soc Am A 18:2846–2859

    Article  Google Scholar 

  • Tompkins HG (ed) (1993) A users’ guide to ellipsometry. Academic, New York

    Google Scholar 

  • Tompkins HG, McGahan WA (eds) (1999) Spectroscopic ellipsometry and reflectometry: a user’s guide. Wiley, New York

    Google Scholar 

  • Tripathi S, Toussaint KC (2009) Rapid Mueller matrix polarimetry based on parallelized polarization state generation and detection. Opt Express 17:21396–21407

    Article  Google Scholar 

  • Tschimwang A, Zhan Q (2010) High-spatial-resolution nulling microellipsometer using rotational polarization symmetry. Appl Opt 49:1574–1580

    Article  Google Scholar 

  • Wang X, Mason J, Latta M, Strand T, Marx D, Psaltis D (2001) Measuring and modeling optical diffraction from subwavelength features. J Opt Soc Am A 18:565–572

    Article  Google Scholar 

  • Wolf E (1959) Electromagnetic diffraction in optical systems I. An integral representation of the image field. Proc R Soc Ser A 253:349–357

    Article  MathSciNet  Google Scholar 

  • Zhan Q, Leger JR (2001) Imaging ellipsometry for high-spatial-resolution metrology. Invited paper. SPIE Proc 4435:65–76

    Article  Google Scholar 

  • Zhan Q, Leger JR (2002a) A high resolution imaging ellipsometer. Appl Opt 41:4443–4450

    Article  Google Scholar 

  • Zhan Q, Leger JR (2002b) Interferometric measurement of Berry’s phase in space-variant polarization manipulations. Opt Commun 213:241–245

    Article  Google Scholar 

  • Zhan Q, Leger JR (2002c) Microellipsometer with radial symmetry. Appl Opt 41:4630–4637

    Article  Google Scholar 

  • Zhan Q, Leger JR (2002d) Focus shaping using cylindrical vector beams. Opt Express 10:324–331

    Article  Google Scholar 

  • Zhan Q, Leger JR (2002e) Measurement of surface features beyond the diffraction limit using an imaging ellipsometer. Opt Lett 47:821–823

    Article  Google Scholar 

  • Zhan Q, Leger JR (2002f) Measuring unresolved surface features using imaging ellipsometric polarization signatures. In: DOMO technical digest, Diffractive-Optics Micro-optics (DOMO) topical meeting, Tucson, pp 101–103

    Google Scholar 

  • Zhan Q, Leger JR (2003) Near-field nano-ellipsometer for ultrathin film characterization. J Microsc 210:214–219

    Article  MathSciNet  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Qiwen Zhan .

Editor information

Editors and Affiliations

Section Editor information

Rights and permissions

Reprints and permissions

Copyright information

© 2018 Springer Nature Switzerland AG

About this entry

Check for updates. Verify currency and authenticity via CrossMark

Cite this entry

Chen, J., Zhan, Q. (2018). Ellipsometry. In: Ida, N., Meyendorf, N. (eds) Handbook of Advanced Non-Destructive Evaluation. Springer, Cham. https://doi.org/10.1007/978-3-319-30050-4_8-1

Download citation

  • DOI: https://doi.org/10.1007/978-3-319-30050-4_8-1

  • Received:

  • Accepted:

  • Published:

  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-30050-4

  • Online ISBN: 978-3-319-30050-4

  • eBook Packages: Springer Reference EngineeringReference Module Computer Science and Engineering

Publish with us

Policies and ethics