Abstract
Wet etching is a popular process in the mass production for electronic devices, especially in the display and integrated circuit industry. The major techniques of wet etching are described in this chapter. It begins with a technical overview and discussion of the applications of wet etching in flat panel display fabrication. The chapter explains the principles of wet etching in terms of etching mechanisms, materials processing, and other critical factors. In the applications, some special requests are involved in the etching process. Moreover, the process requirements such as tools, etchants, special considerations, and control factors are also explained. The chapter concludes with a discussion on the future development of wet etching.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Abbreviations
- BOE:
-
Buffered Oxide Etch
- CD:
-
Critical Dimension
- IGZO:
-
Indium Gallium Zinc Oxide
- ITO:
-
Indium Tin Oxide
- IZO:
-
Indium Zinc Oxide
- LCD:
-
Liquid Crystal Display
- MoW:
-
Molybdenum Tungsten
- TFT:
-
Thin-Film Transistor
References
Lee CY, Chang C, Shih WP, Dai CL (2010) Wet etching rates of InGaZnO for the fabrication of transparent thin-film transistors on plastic substrates. Thin Solid Film 518:3992
Cheong WS, Yoon YS, Shin JH, Hwang CS, Chu HY (2009) Process development of ITO source/drain electrode for the top-gate indium–gallium–zinc oxide transparent thin-film transistor. Thin solid film 517:4094
Lee HN, Kyung J, Sung MC, Kim DY, Kang SK, Kim SJ, Kim CN, Kim HG, Kim ST (2008) Oxide TFT with multilayer gate insulator for backplane of AMOLED device. J Soc Inf Display 16:265
Wei HF, Hsiue GH, Liu CY, Chen KF (2008) Jpn J Appl Phys 47:9001
Franssila S (2004) Enhancement of dimension uniformity of wet-etched thick insulator holes in triode carbon nanotube field emisson display devices. Introduction to microfabrication. Wiley, New York, p 120
Taylor D (1998) Wet-etch process improvements through SPC. Solid State Tech 119
Dini JW (1984) Fundamental of chemical milling. American Machinist 768:113
El-Hofy HAG (2005) Advanced machining processes. McGraw-Hill, Blacklick, p 115
Collie MJ (1982) Etching compositions and process. Noyes data, Park Ridge, NJ, p 80
Sangwal K (1985) Etching of crystals theory, experiment, and application. Defects in solids. North Holand, Amsterdam, p 20
Quirk M (2001) Semiconductor manufacturing technology. Prentice Hall, Upper Saddle River, NJ, p 421
Singer P (1997) The many challenges of oxide etching. Semicond Int 110
Lii Y, Chang C, Sze S (1996) Etching. ULSI technology, McGraw-Hill, New York, 342
Singer P (1993) Meeting oxide, poly and metal etch requirements. Semicond Int Cahners 51
Zant PV (2000) Microchip fabrication. McGraw-Hill, New York, 259
Scholten M, van den Meerakker JEAM (1993) J Electrochem Soc 140:471
Huang CJ, Su YK, Wu SL (2004) On the mechanism of ITO etching: the specificity of halogen acids. Mater Chem Phys 84:146
Köhler M (1999) The effect of solvent on the etching of ITO electrode. Etching in microsystem technology. Wiley-VCH, Weinheim, p 9.
Senturia SD (2001) Microsystem design. Kluwer, New York
Kern W, Deckert C (1978) Thin film processes. Chap V-1, Academic, New York
Plummer JD, Deal MD, Griffin PB (2000) Silicon VLSI technology: fundamentals, practice and modeling. Prentice Hall, Upper Saddle River, NJ
Further Reading
Rai-Choudhury P (1997) Handbook of microlithography, micromachining, and microfabrication, vol 1 and 2. SPIE Press and IEE Press, Bellingham, WA
Nguyen NT, Wereley S (2002) Fundamentals and applications of microfulidics. Artech House, Boston
Madou M (1997) Fundamentals of microfabrication. CRC, London
Jaeger RC (1993) Introduction to microelectronic fabrication. Addison-Wesley, Reading
Walker P, Tarn WH (1991) CRC handbook of metal etchants. CRC press, Boca Raton, pp 287–291
Kohler M (1999) Etching in Microsystem Technology. Wiley, New York, p 329
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2012 Springer-Verlag Berlin Heidelberg
About this entry
Cite this entry
Cheng, HC. (2012). Wet Etching. In: Chen, J., Cranton, W., Fihn, M. (eds) Handbook of Visual Display Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-79567-4_59
Download citation
DOI: https://doi.org/10.1007/978-3-540-79567-4_59
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-540-79566-7
Online ISBN: 978-3-540-79567-4
eBook Packages: EngineeringReference Module Computer Science and Engineering