Definition
Focused ion beam (FIB) can be used as a deposition tool for fabricating nanostructures. FIB chemical vapor deposition (FIB-CVD) uses ion energy to initiate and localize chemical vapor deposition (CVD) in a specific location by a direct-writing technique. When a local gas ambient is produced near a surface, the impact of energetic ions on that surface can induce chemical reaction. The ion-induced chemistry occurs in an adsorbed layer than in the gas above the surface.
FIB-CVD Process
In 1979, Seliger et al. reported Ga ion beams down to 100-nm diameter with current density in the focal spot of 1.5 A/cm2 [1]. In 1990, Wargner et al. demonstrated pillars and walls with high aspect ratios achieved using FIB-CVD [2]. In 2000, Matsui et al. demonstrated three-dimensional (3-D) nanostructure fabrication by FIB-CVD [3].
Matsui et al. used two commercially available FIB systems (SMI9200, SMI2050, SII NanoTechnology Inc., Tokyo,...
References
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Matsui, S. (2015). Focused-Ion-Beam Chemical-Vapor-Deposition (FIB-CVD). In: Bhushan, B. (eds) Encyclopedia of Nanotechnology. Springer, Dordrecht. https://doi.org/10.1007/978-94-007-6178-0_230-2
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DOI: https://doi.org/10.1007/978-94-007-6178-0_230-2
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