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Atomic Layer Deposition

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Encyclopedia of Nanotechnology

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Synonyms

ALD; Atomic layer chemical vapor deposition; Atomic layer CVD (AL-CVD); Atomic layer epitaxy (ALE); Molecular layer deposition (MLD)

Definition

Atomic layer deposition is a method of thin film growth related to chemical vapor deposition whereby two or more vapor-phase precursor chemicals are individually and sequentially introduced to a substrate surface via discrete precursor pulses that are separated by purge steps. Each precursor pulse must yield saturative, self-limiting growth of a monolayer or sub-monolayer of the desired material if an ALD mechanism is operant. The resultant film exhibits excellent thickness uniformity and conformality, even on highly complex and demanding nanoscale substrate features, with the process affording an excellent degree of thickness control at the sub-nanometer level.

Introduction

Atomic layer deposition (ALD) is a technique for the deposition of thin films of solid-state or polymeric materials onto solid substrates from vapor-phase...

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References

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Author information

Authors and Affiliations

  1. Picosun USA, LLC, 719 Griswold Street, Detroit, MI, 4822, USA

    Charles L. Dezelah IV

Authors
  1. Charles L. Dezelah IV
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Corresponding author

Correspondence to Charles L. Dezelah IV .

Editor information

Editors and Affiliations

  1. Biomimetics (NLB²), Ohio State University Nanoprobe Lab. for Bio- & Nanotechnology, Columbus, Ohio, USA

    Bharat Bhushan

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Dezelah, C.L. (2015). Atomic Layer Deposition. In: Bhushan, B. (eds) Encyclopedia of Nanotechnology. Springer, Dordrecht. https://doi.org/10.1007/978-94-007-6178-0_372-2

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  • DOI: https://doi.org/10.1007/978-94-007-6178-0_372-2

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  • Online ISBN: 978-94-007-6178-0

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