Summary
Results are given on the continuous measuring of the mass thickness of thin metal and dielectric films over a large thickness range by coating experiments with a 4.96 MHz fundamental-mode AT-cut quartz-crystal resonator. The electronic circuit and the construction of a suitable crystal holder with low damping and for reduction of the temperature influence on the quartz frequency is discussed. Also information is given on the mass sensitivity depending on previous mass charges of the quartz crystal obtained in a special arrangement.
Riassunto
Si presentano i risultati di misure continue di spessore effettuate con un cristallo di quarzo oscillante da 4.96 MHz su film evaporati di metalli e sostanze dielettriche in un campo molto ampio di spessori. Si illustrano il circuito elettronico e la costruzione di un supporto del cristallo che non provoca smorzamenti e tale da ridurre l’influenza della temperatura sul cristallo stesso. Si danno inoltre informazioni sulla variazione della sensibilità di massa in funzione delle precedenti cariche di massa del cristallo di quarzo.
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This paper was presented at the 1° Congresso Italiano del Vuoto, Milano, 24–25 November 1967.
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Pulker, H.K., Schädler, W. Factors influencing the accuracy of a quartz-crystal oscillator as a thickness monitor for thin-film deposition. Nuovo Cimento B (1965-1970) 57, 19–24 (1968). https://doi.org/10.1007/BF02710309
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DOI: https://doi.org/10.1007/BF02710309