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Comparative Study of Near Stochiometric a-SiC:H and a-SiC Films: Effect of the Bonded Hydrogen

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Innovative Superhard Materials and Sustainable Coatings for Advanced Manufacturing

Abstract

Amorphous silicon carbon films having near stochiometric composition had been deposited by (i) reactive magnetron sputtering of silicon target in argon-methane gas mixture (a-SiC:H films) and (ii) ion-plasma deposition using polycrystalline silicon carbide as a vacuum arc source (a-SiC films).

Main research objective was focused on peculiarities of the short order structure and electronic properties of a-SiC:H and a-SiC films. It was shown that a-SiC film is more dense and hard in comparison with a- SiC:H. The a-SiC:H films are soft, nanoporous and show visible room temperature photoluminescence. Efficiency of photoluminescence of a- SiC:H can be increased by one order of magnitude by low temperature treatment. It was shown that carbon-hydrogen bonds in Si-C-H structural form play an important role in light absorption and emitting process.

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References

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Vasin, A. et al. (2005). Comparative Study of Near Stochiometric a-SiC:H and a-SiC Films: Effect of the Bonded Hydrogen. In: Lee, J., Novikov, N., Turkevich, V. (eds) Innovative Superhard Materials and Sustainable Coatings for Advanced Manufacturing. NATO Science Series II: Mathematics, Physics and Chemistry, vol 200. Springer, Dordrecht. https://doi.org/10.1007/1-4020-3471-7_34

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