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Electron Interactions with CF4, C2F6, and C3F8

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Fundamental Electron Interactions with Plasma Processing Gases

Part of the book series: Physics of Atoms and Molecules ((PAMO))

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Abstract

In this chapter the current state of our knowledge on the cross sections and the rate coefficients for collisional interactions of the plasma processing gases CF4[1], C2F6[2], and C3F8[3] with electrons is re-viewed, assessed, and discussed. As we have indicated previously, such knowledge is necessary to assess the behavior of these gases in the atmosphere and in their many applications, especially in the semiconductor industry. For instance, the testing of theoretical models for plasma re-actors requires knowledge of collision cross sections over a wide energy range below approximately 100 eV. These are crucial for investigating, understanding, and characterizing the gas-phase reactions in the plasma, and estimating the fluxes of species that are ultimately responsible for the multitude of surface interactions.

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Authors and Affiliations

  1. National Institute of Standards and Technology, Gaithersburg, Maryland, USA

    Loucas G. Christophorou & James K. Olthoff

  2. Academy of Athens, Athens, Greece

    Loucas G. Christophorou

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  1. Loucas G. Christophorou
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  2. James K. Olthoff
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Christophorou, L.G., Olthoff, J.K. (2004). Electron Interactions with CF4, C2F6, and C3F8 . In: Fundamental Electron Interactions with Plasma Processing Gases. Physics of Atoms and Molecules. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-8971-0_4

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  • DOI: https://doi.org/10.1007/978-1-4419-8971-0_4

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