Abstract
Chemical vapor deposition (CVD), i.e. the deposition of a solid by a chemical reaction involving one or several gaseous chemical species and usually thermally activated, has been used for many years in different kinds of applications (e.g. oxidation or/and wear resistant coatings for cemented carbides, steels or alloys, preforms for drawing graded-index optical fibers, thin films for integrated circuits, coatings for nuclear fuels, etc...). In most cases, the substrates considered here have a rather simple shape and are made of non-porous materials.
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© 1986 Plenum Press, New York
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Naslain, R., Langlais, F. (1986). CVD-Processing of Ceramic-Ceramic Composite Materials. In: Tressler, R.E., Messing, G.L., Pantano, C.G., Newnham, R.E. (eds) Tailoring Multiphase and Composite Ceramics. Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-2233-7_12
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DOI: https://doi.org/10.1007/978-1-4613-2233-7_12
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