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Crystalline Functional Oxide Growth Methods

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Integration of Functional Oxides with Semiconductors

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Abstract

Epitaxial thin film deposition methods are the principal means by which functional oxide-on-semiconductor heterostructures are achieved. By adapting the concepts once limited only to the semiconductor field to oxide materials systems, new experimental platforms for integrating the two types of materials into a single structure with cooperative functionality are now starting to become routine. In this chapter, we give a brief outline of five different thin film deposition methods that have been demonstrated to be capable of growing epitaxial oxide thin films on a semiconductor substrate. We describe physical vapor deposition methods such as molecular beam epitaxy, pulsed laser deposition, and sputtering, as well as chemical vapor deposition methods, including metal-organic chemical vapor deposition and atomic layer deposition.

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  1. Department of Physics, The University of Texas at Austin, Austin, TX, USA

    Alexander A. Demkov & Agham B. Posadas

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Demkov, A.A., Posadas, A.B. (2014). Crystalline Functional Oxide Growth Methods. In: Integration of Functional Oxides with Semiconductors. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-9320-4_4

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  • DOI: https://doi.org/10.1007/978-1-4614-9320-4_4

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