Abstract
A major objective in the advancement of electronics technology is the miniaturization of integrated circuits. The limiting factor in this miniaturization is and has been imaging technology, or microlithography. Advances in microlithography will come from better optics, which are designed by engineers, and better photoresists, which are designed by chemists.
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Bogan, L.E. (1994). Understanding the Novolak Synthesis Reaction. In: Prasad, P.N. (eds) Frontiers of Polymers and Advanced Materials. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-2447-2_29
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DOI: https://doi.org/10.1007/978-1-4615-2447-2_29
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