Computer Simulation of Structural Modifications in the Metal Samples Irradiated by Pulsed Beams

Abstract

It is well known^1–3 that one of the effective methods of materials synthesis for modern technologies is the electron and ion surface treatment in a pulsed explosion mode. Energy deposition in a thin surface layer by the high energy electron and ion beams can lead to a completely new structure on the surface which can possess interesting physical and chemical properties^{2, 4,} For almost three decades the ion beams have been used for modification of materials in manufacturing integrated circuits^5–6. One of the aspects of the electron and ion beam irradiation of materials consists in transforming the material parameters which are of particular interest for metallurgy. For example, the electron and ion beam irradiation of metals can change the metal hardening, fatigue, corrosion resistance and essentially increase their strength^2,7 We also should note using the beam modifications for hardening and improving the tribological properties of the surfaces, ion implantation, molecular epitaxy, etc.^8,9. The ion beams used for these applications range from keV up to MeV of energy and penetrate the target material to the depths ranging from tens of nanometers to microns. The keV particle bombardment of solids is used for fabrication in semiconductor industry¹⁰.