Abstract
In the past few years, the use of lasers to induce or enhance chemical reactions at gas-solid interfaces has experienced a rapid growth driven both by technological and scientific interest1,2. Laser photochemical deposition and laser direct writing of fine metal patterns from metalorganic precursors3,4 are low-temperature techniques which are fully compatible with current integrated circuit (IC) technology and can be used to repair5 and customize6 integrated circuits in situ without the need of a masking step. However very few publications7–10 have been devoted to the mechanisms of laser photochemical deposition including gas phase and adsorbed phase contributions, and particularly of photonucleation where the surface adsorbates can play the major role.
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References
D. J. Ehrlich and J. Y. Tsao, J. Vac. Sci. Technol. B1, 969 (1983).
T. J. Chuang, Surf. Sci. Rep. 3, 1 (1983).
D. J. Ehrlich, R. M. Osgood and T. F. Deutsch, J. Vac. Sci. Technol. 21, 23 (1982).
R. M. Osgood and H. H. Gilgen, Ann. Rev. Mater. Sci. 15, 549 (1985).
J. N. Randall, D. J. Ehrlich and J. Y. Tsao, J. Vac. Sci. Technol. B3, 262 (1985).
J. G. Black, S. P. Doran, M. Rothschild and D. J. Ehrlich, Appl. Phys. Lett. 50, 1016 (1987).
T. H. Wood, J. C. White and B. A. Thacker, Appl. Phys. Lett. 42, 408 (1983).
J. Y. Tsao and D. J. Ehrlich, SPIE Proc. 459, 2 (1984).
J. Y. Tsao, H. J. Zeigler and D. J. Ehrlich, Surf. Sci. 160, 419 (1985).
C. J. Chen, J. Vac. Sci. Technol. A5, 3386 (1987).
J. Y. Tsao and D. J. Ehrlich, Appl. Phys. Lett. 45, 617 (1984).
G. S. Higashi and C. G. Fleming, Appl. Phys. Lett. 48, 1051 (1986).
G. S. Higashi, G. E. Blonder and C. G. Fleming, Mat. Res. Soc. Symp. Proc. 75, 117 (1987).
J.E. Bourée and J. Flicstein, Mat. Res. Soc. Symp. Proc. 101. 55 (1988).
T. Cacouris, G. Scelsi, P. Shaw, R. Scarmozzino, R. M. Osgood and R. R. Krchnavek, Appl. Phys. Lett. 52, 1865 (1988).
D. W. Squire, C. S. Dulcey and M. C. Lin, Chem. Phys. Lett. 116, 525 (1985).
D. W. Squire, C. S. Dulcey and M. C. Lin, J. Vac. Sci. Technol. B3, 1513 (1985).
T. Motooka, S. Gorbatkin, D. Lubben, D. Eres and J. E. Greene, J. Vac. Sci. Technol. A4, 3146 (1986).
D. Eres, T. Motooka, S. Gorbatkin, D. Lubben and J. E. Greene, J. Vac. Sci. Technol. B5, 848 (1987).
D. Lubben, T. Motooka, J. E. Greene, J. F. Wendelken, J. E. Sundgren and W. R. Salaneck, Mat. Res. Soc. Symp. Proc. 101, (1988).
G. S. Higashi, J. Chem. Phys. 88, 422 (1988).
G. S. Higashi and L. J. Rothberg, J. Vac. Sci. Technol. B3, 1460 (1985).
G. S. Higashi and L. J. Rothberg, Appl. Phys. Lett. 47, 1288 (1985).
P. D. Dapkus, Ann. Rev. Mater. Sci. 12, 243 (1982).
D. H. Reep and S. K. Gandhi, J. Electrochem. Soc. 130, 675 (1983).
J.E. Bourée, J. Flicstein and Y. I. Nissim, Mat. Res. Soc. Symp. Proc. 75, 129 (1987).
N. Suzuki, C. Anayama, K. Masu, K. Tsubouchi and N. Mikoshiba, Jap. J. Appl. Phys. 25, 1236 (1986).
J. Flicstein, J.E. Bourée, J.F. Bresse and A.M. Pougnet, Mat. Res. Soc. Symp. Proc. 101, 49 (1988).
J. Flicstein and J.E. Bourée, MRS-Europe Symp. Proc. (1988).
J.E. Bourée, in “Interactions Plasmas Froids-Matériaux” (Editions de Physique, Les Ulis) p. 185 (1988).
J.E. Bourée and J. Flicstein, NATO ASI Series E139. 121 (1988).
J. Y. Tsao and D. J. Ehrlich, J. Cryst. Growth 68, 176 (1984).
Y. J. Chabal, Phys. Rev. B29, 3677 (1984).
D. J. Ehrlich and R. M. Osgood, Chem. Phys. Lett. 79, 381 (1981).
G. S. Higashi, G. E. Blonder, C.G. Fleming, V. R. McCrary and V. M. Donnelly, J. Vac. Sci. Technol. B5, 1441 (1987).
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Bourree, J.E., Flicstein, J. (1989). Photonucleation and Photodeposition of A1 on Si from Flowing. In: Cole-Hamilton, D.J., Williams, J.O. (eds) Mechanisms of Reactions of Organometallic Compounds with Surfaces. NATO ASI Series, vol 198. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2522-0_5
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