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Processing Techniques

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Semiconductors

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Abstract

The semiconductor industry is nowadays under constant pressure to produce devices which are cheaper, smaller, more powerful, and efficient. Moreover, current advances in the production of thin layers have made a whole new range of devices manufacturable. Thin films on substrates are generally prepared using bulk growth methods or physical vapor deposition (PVD) and chemical vapor deposition (CVD) . Growth and processing techniques of materials including semiconductors are reviewed in this chapter.

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Authors and Affiliations

  1. Nanotechnology Institute, CNR-NANOTEC, University La Sapienza, P. zle Aldo Moro, Rome, Italy

    Barbara Cortese

  2. P.LAS.M.I Lab@Bari, Nanotechnology Institute, CNR-NANOTEC, Via Amendola 122/D 70,126, Bari, Italy

    Luciano Velardi

  3. Nanotechnology Institute, CNR-NANOTEC, Via per Monteroni, 73100, Lecce, Italy

    Ilaria Elena Palamà, Stefania D’Amone, Eliana D’Amone, Gianvito de Iaco, Diego Mangiullo & Giuseppe Gigli

  4. Department Matematica e Fisica ‘Ennio De Giorgi’, University of Salento, Via per Monteroni, 73100, Lecce, Italy

    Giuseppe Gigli

  5. Italian Institute of Technology (IIT)—Center for Biomolecular Nanotechnologies, via Barsanti, Arnesano, Italy

    Giuseppe Gigli

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  1. Barbara Cortese
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  2. Luciano Velardi
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  3. Ilaria Elena Palamà
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Correspondence to Barbara Cortese .

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Editors and Affiliations

  1. Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional—Unidad Saltillo—Ingeniería Cerámica, Ramos Arizpe, Coahuila, Mexico

    Martin I. Pech-Canul

  2. Department of Physics, New Jersey Institute of Technology, Newark, NJ, USA

    Nuggehalli M. Ravindra

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Cortese, B. et al. (2019). Processing Techniques. In: Pech-Canul, M., Ravindra, N. (eds) Semiconductors. Springer, Cham. https://doi.org/10.1007/978-3-030-02171-9_2

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