Abstract
Reliability has become a significant challenge for design of current nanometer integrated circuits (ICs). Reliability degradation caused by aging effects are becoming limiting constraints in emerging computing and communication platforms due to increased failure rates from the continuous transistor scaling, increasing process variations, and aggressive power reductions. The introduction of new materials, processes, and devices coupled with voltage scaling limitations and increasing power density will impose many new reliability challenges.
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Tan, S., Tahoori, M., Kim, T., Wang, S., Sun, Z., Kiamehr, S. (2019). Introduction. In: Long-Term Reliability of Nanometer VLSI Systems. Springer, Cham. https://doi.org/10.1007/978-3-030-26172-6_1
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DOI: https://doi.org/10.1007/978-3-030-26172-6_1
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