Abstract
In order to improve the existing plasma techniques and to develop new processes, physicists and engineers need predictive models based on plasma physics, chemical physics and hydrodynamics. The knowledge of physical and chemical data must be checked or determined through experiments. Moreover, the reproducibility of a process is largely related to the control of some determining plasma parameters, which can be performed through diagnostics. For all these reasons plasma diagnostic techniques are of fundamental importance. In the last 30 years, many types of plasma diagnostics have been developed (Lochte-Holtgreven 1968; Donnelly et al. 1990; Preppernau et al. 1993; Jolly 1995), each of them allowing one to access one or more plasma parameters, but no one being able to fully characterize plasmas. So, plasma physicists have to simultaneously or successively use various diagnostics depending on the objective of their study. Among the main techniques currently used to characterize plasmas we may mention electric and magnetic probes, mass spectrometry, emission and absorption spectroscopy and laser-based techniques.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
N.G. Adams, C.R. Herd, D. Smith, Development of the flowing afterglow Langmuir probe technique for studying the neutral products of dissociative recombination using spectroscopic techniques - OH production in the HCO-2(+)+E reaction. J. Chem. Phys. 91, 963–973 (1989)
M. Aldén, H. Edner, P. Grafström, S. Svanberg, Two-photon excitation of atomic oxygen in a flame. Opt. Commun. 42, 244–246 (1982)
J. Amorim, G. Baravian, A. Ricard, Production of N, H and NH active species in N2–H2dc flowing discharges. Plasma Chem. Plasma Process. 15, 721–731 (1995)
J. Amorim, G. Baravian, J. Jolly, Laser-induced resonance fluorescence as a diagnostic technique in non-thermal equilibrium plasmas. J. Phys. D Appl. Phys. 33, R51–R65 (2000)
A. Arnold, H. Becker, R. Suntz, P. Monkhouse, J. Wolfrum, R. Maly, W. Pfister, Flame front imaging in an internal-combustion engine simulator by laser-induced fluorescence of acetaldehyde. Opt. Lett. 15, 831–833 (1990)
N.G. Basov, V.A. Danilychev, Y.M. Popov, Stimulated emission in the vacuum ultraviolet region. Sov. J. Quantum Electron. 1, 18–22 (1971)
G.P. Davis, R.A. Gottscho, Measurement of spatially resolved gas-phase plasma temperatures by optical-emission and laser-induced fluorescence spectroscopy. J. Appl. Phys. 54, 3080–3086 (1983)
V.M. Donnelly, D.L. Flamm, G. Collins, Laser diagnostics of plasma-etching – measurement of Cl2 +in a chlorine discharge. J. Vac. Sci. Technol. 21, 817–823 (1982)
V.M. Donnelly, Plasma–Surface Interactions and Processing of Materials(NATO ASI Series E, vol. 176) (Kluwer, Dordrecht, 1990)
F. Fresnet, G. Baravian, S. Pasquiers, C. Postel, V. Puech, A. Rousseau, M. Rozoy, Proc. 14th Int. Symp. Plasma Chemistry(Prague, Czech Republic, 1999), p. 2661
R.A. Gottscho, R.H. Burton, G.P. Davis, Radiative lifetime and collisional quenching of carbon monochloride (A 2-Delta) in an alternating-current glow-discharge. J. Chem. Phys. 77, 5298–5301 (1982)
R.A. Gottscho, M.L. Mandich, Time-resolved optical diagnostics of radio-frequency plasmas. J. Vac. Sci. Technol. A 3, 617–624 (1985)
M. Hamamoto, T. Ohgo, K. Kondo, T. Oda, A. Iiyoshi, K. Uo, Coaxial laser-induced fluorescense spectroscopic system for impurity diagnostics in plasmas. Jap. J. Appl. Phys. 25, 99–102 (1986)
S.G. Hansen, G. Luckman, S.D. Colson, Measurements of F-star, CF and CF2formation and decay in pulsed fluorocarbon discharges. Appl. Phys. Lett. 53, 1588–1590 (1988)
N. Hata, A. Matsuda, K. Tanaka, Spectroscopic diagnostics of plasma-chemical vapor deposition from silane and germane. J. Appl. Phys. 61, 3055–3060 (1987)
C. Hayaud, PhD Thesis, Université Paris-Sud, Orsay, France, 1997 (in French)
F. Hummernbrum, H. Kempkens, A. Ruzicka, H.D. Sauren, C. Schiffer, J. Uhlenbusch, J. Winter, Laser-induced fluorescence measurements on the C(2) Sigma(+) -X(2)Pi(r) transition of the CH radical produced by a microwave excited process plasma. Plasma Sources Sci. Technol. 1, 221–231 (1992)
W. Jacob, M. Engelhard, W. Moller, A. Koch, Absolute density determination of CH radicals in a methane plasma. Appl. Phys. Lett. 64, 971–973 (1994)
J. Jolly, Diagnostics laser dans les plasmas froids. J. Phys. III 5, 1089–1113 (1995)
A. Kono, N. Koike, K. Okuda, T. Goto, Laser-induced fluorescence detection of SiH2radicals in a radiofrequency silane plasma. Jap. J. Appl. Phys. 32, L543–L546 (1993)
M.B. Leong, A.P. D’Silva, V.A. Fassel, Evaluation of stimulated raman-scattering of tunable dye-laser radiation as a primary excitation source for exciting atomic fluorescence in an inductively coupled plasma. Anal. Chem. 58, 2594–2598 (1986)
W. Lochte-Holtgreven, Plasma Diagnostics(North-Holland, Amsterdam, 1968)
K. Niemi, V. Schulz-von der Gathen, H.F. Doebele, Absolute calibration of atomic density measurements by laser-induced fluorescence spectroscopy with two-photon excitation. J. Phys. D Appl. Phys. 34, 2330–2335 (2001)
N. Omenetto, H.G.C. Human, P. Cavalli, G. Rossi, Laser excited atomic and ionic non-resonance fluorescence detection limits for several elements in an argon inductively coupled plasma. Spectrochim. Acta Part B At. Spectrosc. 39, 115–117 (1984)
R. Paschotta, Article on ‘Argon Ion Lasers’ in the Encyclopedia of Laser Physics and Technology, 1st edn. (Wiley-VCH, 2008) ISBN 978-3-527-40828-3
B.L. Preppernau, T.A. Miller, Glow Discharge Spectroscopiesed. by R. Kenneth Marcus (Plenum, New York, 1993)
R.M. Roth, K.G. Spears, G. Wong, Spatial concentrations of silicon atoms by laser-induced fluorescence in a silane glow-discharge. Appl. Phys. Lett. 45, 28–30 (1984)
G.S. Selwyn, Atomic arsenic detection by ArF laser‐induced fluorescence. Appl. Phys. Lett. 51, 167–168 (1987)
S. Singleton, K.G. McKendrick, R.A. Copeland, J.B. Jeffries, Vibrational transition-probabilities in the B-X and B’-X systems of the SiCl radical. J. Phys. Chem. 96, 9703–9709 (1992)
O. Svelto, Principles of Lasers, 4th edn. (Plenum Press, New York, 1998)
K. Tachibana, T. Mukai, H. Harima, Measurement of absolute densities and spatial distributions of Si and SiH in an rf-discharge silane plasma for the chemical vapor- deposition of A-Si-H films. Jap. J. Appl. Phys. 30, L1208–L1211 (1991)
P. Van der Weijer, B.H. Zwerver, Laser-induced fluorescence of OH and SiO molecules during thermal chemical vapor-deposition of SiO2from silane oxygen mixtures. Chem. Phys. Lett. 163, 48–54 (1989)
R. Walkup, P. Avouris, R.W. Dreyfus, J.M. Jasinski, G.S. Selwyn, Laser detection of diatomic products of plasma sputtering and etching. Appl. Phys. Lett. 45, 372–374 (1984)
Author information
Authors and Affiliations
Rights and permissions
Copyright information
© 2016 Springer International Publishing Switzerland
About this chapter
Cite this chapter
Loureiro, J., Amorim, J. (2016). Laser Spectroscopy. In: Kinetics and Spectroscopy of Low Temperature Plasmas. Graduate Texts in Physics. Springer, Cham. https://doi.org/10.1007/978-3-319-09253-9_10
Download citation
DOI: https://doi.org/10.1007/978-3-319-09253-9_10
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-09252-2
Online ISBN: 978-3-319-09253-9
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)