Use of Multilayers for X-UV Optics: Their Fabrication and Tests in France

Abstract

New artificial layered media on a quasi atomic scale can now be obtained by sequential evaporation of two materials. Several evaporation techniques have been used successfully and each one has its own advantage. The qualities required in the layering are dependent on the requirement of the basic or applied needs. A good control of the layer periodicity is important when the periodicity of the material must match with some wavelengths. For interference mirrors adapted to x-uv range, or slow neutron, amorphous or epitaxied materials can equally be used. On the contrary, semiconductor or semimetal supergratings with a low number of defects are necessary for the microelectronic applications. Layered media are also developed to study superconductivity and Young’s modulus. In all cases a full description of the material is needed to understand the observed phenomena, but also for the progress in the evaporation methods.