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Nano Lithography Based on Domain Patterning of Ferroelectrics

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Bio and Nano Packaging Techniques for Electron Devices

Abstract

We report on both the assembly of noble-metal nanowires by means of the nanotechnological and large-scale integrable approach of ferroelectric lithography and their performance testing upon electrical transport. Our results on \(\mathrm{ LiNbO}_3\) single crystal templates show that the deposition of different elemental metals from ionic solutions by photochemical reduction is confined to the ferroelectric 180\(^\circ \) domain walls. Current-voltage-characteristics recorded from such nanowires of typically \((30\ldots 300)\,\)µm in length revealed an ohmic behavior that even improved with time. Additionally, we also examined the local topographic and potentiostatic properties of such wires using dynamic scanning force microscopy (SFM) in combination with Kelvin probe force microscopy (KPFM).

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Authors and Affiliations

  1. Institute of Applied Photophysics, Technische Universität Dresden, 01062, Dresden, Germany

    Alexander Haußmann

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  1. Alexander Haußmann
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Correspondence to Alexander Haußmann .

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Editors and Affiliations

  1. Fak. Elektrotechnik, Inst. Festkörperelektronik, TU Dresden, Helmholtzstr. 18, Dresden, 01069, Sachsen, Germany

    Gerald Gerlach

  2. Fak. Elektrotechnik und, Informationstechnik, TU Dresden, Mommsenstr. 13, Dresden, 01069, Sachsen, Germany

    Klaus-Jürgen Wolter

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Haußmann, A. (2012). Nano Lithography Based on Domain Patterning of Ferroelectrics. In: Gerlach, G., Wolter, KJ. (eds) Bio and Nano Packaging Techniques for Electron Devices. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-28522-6_13

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