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Ultrashort Pulse Generation with Additive Pulse Modelocking in Solid State Lasers: Ti:Al2O3, Diode Pumped Nd:YAG and Nd:YLF

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Ultrafast Phenomena VII

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 53))

Abstract

Additive pulse modelocking provides a powerful technique for passive modelocking a wide variety of solid state lasers. The additive pulse modelocking technique uses a laser coupled with a nonlinear external cavity to produce modelocking by a fast saturable absorber like mechanism without the need for active modulation. Ultrashort pulse generation is demonstrated in Ti:Al2O3, diode pumped Nd:YAG and Nd:YLF.

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References

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Author information

Authors and Affiliations

  1. Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA

    J. Goodberlet, J. Jacobson, J. Wang & J. G. Fujimoto

  2. Lincoln Laboratories, Lexington, MA, 02173, USA

    T. Y. Fan & P. A. Schulz

Authors
  1. J. Goodberlet
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  2. J. Jacobson
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  3. J. Wang
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  4. J. G. Fujimoto
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  5. T. Y. Fan
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  6. P. A. Schulz
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Editor information

Editors and Affiliations

  1. Department of Chemistry, University of California, 94720, Berkeley, CA, USA

    Charles B. Harris Ph.D.

  2. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 02139, Cambridge, MA, USA

    Erich P. Ippen Ph.D.

  3. Electrical Engineering and Computer Science Department, University of Michigan, 48109, Ann Arbor, MI, USA

    Gerard A. Mourou Ph.D.

  4. Department of Chemistry, California Institute of Technology, 91125, Pasadena, CA, USA

    Ahmed H. Zewail Ph.D.

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© 1990 Springer-Verlag Berlin, Heidelberg

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Goodberlet, J., Jacobson, J., Wang, J., Fujimoto, J.G., Fan, T.Y., Schulz, P.A. (1990). Ultrashort Pulse Generation with Additive Pulse Modelocking in Solid State Lasers: Ti:Al2O3, Diode Pumped Nd:YAG and Nd:YLF. In: Harris, C.B., Ippen, E.P., Mourou, G.A., Zewail, A.H. (eds) Ultrafast Phenomena VII. Springer Series in Chemical Physics, vol 53. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84269-6_3

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  • DOI: https://doi.org/10.1007/978-3-642-84269-6_3

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-84271-9

  • Online ISBN: 978-3-642-84269-6

  • eBook Packages: Springer Book Archive

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