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Cold Plasma and Thin Film Formation

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Film Deposition by Plasma Techniques

Part of the book series: Springer Series on Atoms+Plasmas ((SSAOPP,volume 10))

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Abstract

Charged and neutral particles, such as ions, electrons, radicals, molecules and atoms, give rise to various physical and chemical reactions when interacting with solid surfaces. In this chapter, fundamental concepts of these reactions will be presented, then the film-formation processes in which cold plasma is employed, and their respective features will be described.

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Authors and Affiliations

  1. Max-Planck-Institut für Festkörperforschung, Heisenbergstrasse 1, W-7000, Stuttgart 80, Fed. Rep. of Germany

    Dr. Mitsuharu Konuma

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  1. Dr. Mitsuharu Konuma
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© 1992 Springer-Verlag Berlin Heidelberg

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Konuma, M. (1992). Cold Plasma and Thin Film Formation. In: Film Deposition by Plasma Techniques. Springer Series on Atoms+Plasmas, vol 10. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84511-6_5

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  • DOI: https://doi.org/10.1007/978-3-642-84511-6_5

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-84513-0

  • Online ISBN: 978-3-642-84511-6

  • eBook Packages: Springer Book Archive

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