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In Situ Study of MBE Growth Mechanisms Using RHEED Techniques — Some Consequences of Multiple Scattering

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Two-Dimensional Systems: Physics and New Devices

Part of the book series: Springer Series in Solid-State Sciences ((SSSOL,volume 67))

Abstract

Very few methods are available for direct in-situ investigation of crystal growth mechanisms at the atomic level, but the forward scattering geometry of reflection high energy electron diffraction (RHEED) is particularly well suited to studies of molecular beam epitaxy (MBE) growth dynamics. After describing the basic concepts of the RHEED intensity oscillation technique, the influence of multiple scattering effects on the form of the oscillations is demonstrated. It is then shown how the relative contributions of the various diffraction processes involved can be used to derive models of growth dynamics, treating GaAs (001) films as an example.

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Author notes

  1. J. Zhang

    Present address: Department of Physics, Imperial College of Science and Technology, Prince Consort Road, South Kensington, London, SW7 2BZ, England

Authors and Affiliations

  1. Philips Research Laboratories, Redhill, Surrey, RH1 5HA, England

    B. A. Joyce, P. J. Dobson, J. H. Neave & J. Zhang

Authors
  1. B. A. Joyce
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  2. P. J. Dobson
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  3. J. H. Neave
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  4. J. Zhang
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Editor information

Editors and Affiliations

  1. Institut für Physik, Montanuniversität Leoben, Franz-Josef-Straße 18, A-8700, Leoben, Austria

    Günther Bauer

  2. Institut für Festkörperphysik, Universität Wien, A-1090, Wien, Austria

    Friedemar Kuchar

  3. Institut für Experimentalphysik, Universität Linz, A-4040, Linz, Austria

    Helmut Heinrich

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© 1986 Springer-Verlag Berlin Heidelberg

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Joyce, B.A., Dobson, P.J., Neave, J.H., Zhang, J. (1986). In Situ Study of MBE Growth Mechanisms Using RHEED Techniques — Some Consequences of Multiple Scattering. In: Bauer, G., Kuchar, F., Heinrich, H. (eds) Two-Dimensional Systems: Physics and New Devices. Springer Series in Solid-State Sciences, vol 67. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-02470-6_5

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  • DOI: https://doi.org/10.1007/978-3-662-02470-6_5

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-662-02472-0

  • Online ISBN: 978-3-662-02470-6

  • eBook Packages: Springer Book Archive

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