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Preparation and Patterning of Silicon Nitride Layers and Films

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Si Silicon

Part of the book series: Si. Silicium. Silicon (System-Nr. 15) ((2074,volume S-i / B / 1-5 / 5 / c))

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Abstract

The chemistry of preparing silicon nitride and the techniques to fabricate thin layers of silicon nitride in general are covered in detail in “Silicon” Suppl. Vol. B 5a. Preparation techniques relevant to general applications of silicon nitride in microelectronics are treated briefly in Chapter 2.1, p. 5; those relevant to specific devices are included in the respective chapters of this volume.

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Authors and Affiliations

  1. Universität Frankfurt/Main, Germany

    Eberhard F. Krimmel

  2. Universität Erlangen, Nürnberg, Germany

    Rudolf Hezel

  3. Gmelin Institute, Frankfurt/Main, Germany

    Uwe Nohl & Rainer Bohrer

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Krimmel, E.F., Hezel, R., Nohl, U., Bohrer, R. (1991). Preparation and Patterning of Silicon Nitride Layers and Films. In: Pebler, A., Schröder, F. (eds) Si Silicon. Si. Silicium. Silicon (System-Nr. 15), vol S-i / B / 1-5 / 5 / c. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-09901-8_2

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